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gem5/public/gem5/refs/heads/multi-isa/./ext/mcpat/cacti/technology.cc
blob: f2e0ef1965ad8fbdceffa7435c6767fbeaa8e4c3 [file] [edit]
/*****************************************************************************
* McPAT/CACTI
* SOFTWARE LICENSE AGREEMENT
* Copyright 2012 Hewlett-Packard Development Company, L.P.
* Copyright (c) 2010-2013 Advanced Micro Devices, Inc.
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#include "basic_circuit.h"
#include "parameter.h"
double wire_resistance(double resistivity, double wire_width,
double wire_thickness,
double barrier_thickness, double dishing_thickness,
double alpha_scatter) {
double resistance;
resistance = alpha_scatter * resistivity /
((wire_thickness - barrier_thickness - dishing_thickness) *
(wire_width - 2 * barrier_thickness));
return(resistance);
}
double wire_capacitance(double wire_width, double wire_thickness,
double wire_spacing,
double ild_thickness, double miller_value,
double horiz_dielectric_constant,
double vert_dielectric_constant, double fringe_cap) {
double vertical_cap, sidewall_cap, total_cap;
vertical_cap = 2 * PERMITTIVITY_FREE_SPACE * vert_dielectric_constant * wire_width / ild_thickness;
sidewall_cap = 2 * PERMITTIVITY_FREE_SPACE * miller_value * horiz_dielectric_constant * wire_thickness / wire_spacing;
total_cap = vertical_cap + sidewall_cap + fringe_cap;
return(total_cap);
}
void init_tech_params(double technology, bool is_tag) {
int iter, tech, tech_lo, tech_hi;
double curr_alpha, curr_vpp;
double wire_width, wire_thickness, wire_spacing,
fringe_cap, pmos_to_nmos_sizing_r;
// double aspect_ratio,ild_thickness, miller_value = 1.5, horiz_dielectric_constant, vert_dielectric_constant;
double barrier_thickness, dishing_thickness, alpha_scatter;
double curr_vdd_dram_cell, curr_v_th_dram_access_transistor, curr_I_on_dram_cell, curr_c_dram_cell;
uint32_t ram_cell_tech_type = (is_tag) ? g_ip->tag_arr_ram_cell_tech_type : g_ip->data_arr_ram_cell_tech_type;
uint32_t peri_global_tech_type = (is_tag) ? g_ip->tag_arr_peri_global_tech_type : g_ip->data_arr_peri_global_tech_type;
technology = technology * 1000.0; // in the unit of nm
// initialize parameters
g_tp.reset();
double gmp_to_gmn_multiplier_periph_global = 0;
double curr_Wmemcella_dram, curr_Wmemcellpmos_dram, curr_Wmemcellnmos_dram,
curr_area_cell_dram, curr_asp_ratio_cell_dram, curr_Wmemcella_sram,
curr_Wmemcellpmos_sram, curr_Wmemcellnmos_sram, curr_area_cell_sram,
curr_asp_ratio_cell_sram, curr_I_off_dram_cell_worst_case_length_temp;
double curr_Wmemcella_cam, curr_Wmemcellpmos_cam, curr_Wmemcellnmos_cam, curr_area_cell_cam,//Sheng: CAM data
curr_asp_ratio_cell_cam;
double SENSE_AMP_D, SENSE_AMP_P; // J
double area_cell_dram = 0;
double asp_ratio_cell_dram = 0;
double area_cell_sram = 0;
double asp_ratio_cell_sram = 0;
double area_cell_cam = 0;
double asp_ratio_cell_cam = 0;
double mobility_eff_periph_global = 0;
double Vdsat_periph_global = 0;
double nmos_effective_resistance_multiplier;
double width_dram_access_transistor;
double curr_logic_scaling_co_eff = 0;//This is based on the reported numbers of Intel Merom 65nm, Penryn45nm and IBM cell 90/65/45 date
double curr_core_tx_density = 0;//this is density per um^2; 90, ...22nm based on Intel Penryn
double curr_chip_layout_overhead = 0;
double curr_macro_layout_overhead = 0;
double curr_sckt_co_eff = 0;
if (technology < 181 && technology > 179) {
tech_lo = 180;
tech_hi = 180;
} else if (technology < 91 && technology > 89) {
tech_lo = 90;
tech_hi = 90;
} else if (technology < 66 && technology > 64) {
tech_lo = 65;
tech_hi = 65;
} else if (technology < 46 && technology > 44) {
tech_lo = 45;
tech_hi = 45;
} else if (technology < 33 && technology > 31) {
tech_lo = 32;
tech_hi = 32;
} else if (technology < 23 && technology > 21) {
tech_lo = 22;
tech_hi = 22;
if (ram_cell_tech_type == 3 ) {
cout << "current version does not support eDRAM technologies at "
<< "22nm" << endl;
exit(0);
}
} else if (technology < 180 && technology > 90) {
tech_lo = 180;
tech_hi = 90;
} else if (technology < 90 && technology > 65) {
tech_lo = 90;
tech_hi = 65;
} else if (technology < 65 && technology > 45) {
tech_lo = 65;
tech_hi = 45;
} else if (technology < 45 && technology > 32) {
tech_lo = 45;
tech_hi = 32;
} else if (technology < 32 && technology > 22) {
tech_lo = 32;
tech_hi = 22;
}
// else if (technology < 22 && technology > 16)
// {
// tech_lo = 22;
// tech_hi = 16;
// }
else {
cout << "Invalid technology nodes" << endl;
exit(0);
}
double vdd[NUMBER_TECH_FLAVORS];
double Lphy[NUMBER_TECH_FLAVORS];
double Lelec[NUMBER_TECH_FLAVORS];
double t_ox[NUMBER_TECH_FLAVORS];
double v_th[NUMBER_TECH_FLAVORS];
double c_ox[NUMBER_TECH_FLAVORS];
double mobility_eff[NUMBER_TECH_FLAVORS];
double Vdsat[NUMBER_TECH_FLAVORS];
double c_g_ideal[NUMBER_TECH_FLAVORS];
double c_fringe[NUMBER_TECH_FLAVORS];
double c_junc[NUMBER_TECH_FLAVORS];
double I_on_n[NUMBER_TECH_FLAVORS];
double I_on_p[NUMBER_TECH_FLAVORS];
double Rnchannelon[NUMBER_TECH_FLAVORS];
double Rpchannelon[NUMBER_TECH_FLAVORS];
double n_to_p_eff_curr_drv_ratio[NUMBER_TECH_FLAVORS];
double I_off_n[NUMBER_TECH_FLAVORS][101];
double I_g_on_n[NUMBER_TECH_FLAVORS][101];
double gmp_to_gmn_multiplier[NUMBER_TECH_FLAVORS];
double long_channel_leakage_reduction[NUMBER_TECH_FLAVORS];
for (iter = 0; iter <= 1; ++iter) {
// linear interpolation
if (iter == 0) {
tech = tech_lo;
if (tech_lo == tech_hi) {
curr_alpha = 1;
} else {
curr_alpha = (technology - tech_hi) / (tech_lo - tech_hi);
}
} else {
tech = tech_hi;
if (tech_lo == tech_hi) {
break;
} else {
curr_alpha = (tech_lo - technology) / (tech_lo - tech_hi);
}
}
if (tech == 180) {
//180nm technology-node. Corresponds to year 1999 in ITRS
//Only HP transistor was of interest that 180nm since leakage power was not a big issue. Performance was the king
//MASTAR does not contain data for 0.18um process. The following parameters are projected based on ITRS 2000 update and IBM 0.18 Cu Spice input
bool Aggre_proj = false;
SENSE_AMP_D = .28e-9; // s
SENSE_AMP_P = 14.7e-15; // J
vdd[0] = 1.5;
Lphy[0] = 0.12;//Lphy is the physical gate-length. micron
Lelec[0] = 0.10;//Lelec is the electrical gate-length. micron
t_ox[0] = 1.2e-3 * (Aggre_proj ? 1.9 / 1.2 : 2);//micron
v_th[0] = Aggre_proj ? 0.36 : 0.4407;//V
c_ox[0] = 1.79e-14 * (Aggre_proj ? 1.9 / 1.2 : 2);//F/micron2
mobility_eff[0] = 302.16 * (1e-2 * 1e6 * 1e-2 * 1e6); //micron2 / Vs
Vdsat[0] = 0.128 * 2; //V
c_g_ideal[0] = (Aggre_proj ? 1.9 / 1.2 : 2) * 6.64e-16;//F/micron
c_fringe[0] = (Aggre_proj ? 1.9 / 1.2 : 2) * 0.08e-15;//F/micron
c_junc[0] = (Aggre_proj ? 1.9 / 1.2 : 2) * 1e-15;//F/micron2
I_on_n[0] = 750e-6;//A/micron
I_on_p[0] = 350e-6;//A/micron
//Note that nmos_effective_resistance_multiplier, n_to_p_eff_curr_drv_ratio and gmp_to_gmn_multiplier values are calculated offline
nmos_effective_resistance_multiplier = 1.54;
n_to_p_eff_curr_drv_ratio[0] = 2.45;
gmp_to_gmn_multiplier[0] = 1.22;
Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];//ohm-micron
Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];//ohm-micron
long_channel_leakage_reduction[0] = 1;
I_off_n[0][0] = 7e-10;//A/micron
I_off_n[0][10] = 8.26e-10;
I_off_n[0][20] = 9.74e-10;
I_off_n[0][30] = 1.15e-9;
I_off_n[0][40] = 1.35e-9;
I_off_n[0][50] = 1.60e-9;
I_off_n[0][60] = 1.88e-9;
I_off_n[0][70] = 2.29e-9;
I_off_n[0][80] = 2.70e-9;
I_off_n[0][90] = 3.19e-9;
I_off_n[0][100] = 3.76e-9;
I_g_on_n[0][0] = 1.65e-10;//A/micron
I_g_on_n[0][10] = 1.65e-10;
I_g_on_n[0][20] = 1.65e-10;
I_g_on_n[0][30] = 1.65e-10;
I_g_on_n[0][40] = 1.65e-10;
I_g_on_n[0][50] = 1.65e-10;
I_g_on_n[0][60] = 1.65e-10;
I_g_on_n[0][70] = 1.65e-10;
I_g_on_n[0][80] = 1.65e-10;
I_g_on_n[0][90] = 1.65e-10;
I_g_on_n[0][100] = 1.65e-10;
//SRAM cell properties
curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_sram = 1.46;
//CAM cell properties //TODO: data need to be revisited
curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;//360
curr_asp_ratio_cell_cam = 2.92;//2.5
//Empirical undifferetiated core/FU coefficient
curr_logic_scaling_co_eff = 1.5;//linear scaling from 90nm
curr_core_tx_density = 1.25 * 0.7 * 0.7 * 0.4;
curr_sckt_co_eff = 1.11;
curr_chip_layout_overhead = 1.0;//die measurement results based on Niagara 1 and 2
curr_macro_layout_overhead = 1.0;//EDA placement and routing tool rule of thumb
}
if (tech == 90) {
SENSE_AMP_D = .28e-9; // s
SENSE_AMP_P = 14.7e-15; // J
//90nm technology-node. Corresponds to year 2004 in ITRS
//ITRS HP device type
vdd[0] = 1.2;
Lphy[0] = 0.037;//Lphy is the physical gate-length. micron
Lelec[0] = 0.0266;//Lelec is the electrical gate-length. micron
t_ox[0] = 1.2e-3;//micron
v_th[0] = 0.23707;//V
c_ox[0] = 1.79e-14;//F/micron2
mobility_eff[0] = 342.16 * (1e-2 * 1e6 * 1e-2 * 1e6); //micron2 / Vs
Vdsat[0] = 0.128; //V
c_g_ideal[0] = 6.64e-16;//F/micron
c_fringe[0] = 0.08e-15;//F/micron
c_junc[0] = 1e-15;//F/micron2
I_on_n[0] = 1076.9e-6;//A/micron
I_on_p[0] = 712.6e-6;//A/micron
//Note that nmos_effective_resistance_multiplier, n_to_p_eff_curr_drv_ratio and gmp_to_gmn_multiplier values are calculated offline
nmos_effective_resistance_multiplier = 1.54;
n_to_p_eff_curr_drv_ratio[0] = 2.45;
gmp_to_gmn_multiplier[0] = 1.22;
Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];//ohm-micron
Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];//ohm-micron
long_channel_leakage_reduction[0] = 1;
I_off_n[0][0] = 3.24e-8;//A/micron
I_off_n[0][10] = 4.01e-8;
I_off_n[0][20] = 4.90e-8;
I_off_n[0][30] = 5.92e-8;
I_off_n[0][40] = 7.08e-8;
I_off_n[0][50] = 8.38e-8;
I_off_n[0][60] = 9.82e-8;
I_off_n[0][70] = 1.14e-7;
I_off_n[0][80] = 1.29e-7;
I_off_n[0][90] = 1.43e-7;
I_off_n[0][100] = 1.54e-7;
I_g_on_n[0][0] = 1.65e-8;//A/micron
I_g_on_n[0][10] = 1.65e-8;
I_g_on_n[0][20] = 1.65e-8;
I_g_on_n[0][30] = 1.65e-8;
I_g_on_n[0][40] = 1.65e-8;
I_g_on_n[0][50] = 1.65e-8;
I_g_on_n[0][60] = 1.65e-8;
I_g_on_n[0][70] = 1.65e-8;
I_g_on_n[0][80] = 1.65e-8;
I_g_on_n[0][90] = 1.65e-8;
I_g_on_n[0][100] = 1.65e-8;
//ITRS LSTP device type
vdd[1] = 1.3;
Lphy[1] = 0.075;
Lelec[1] = 0.0486;
t_ox[1] = 2.2e-3;
v_th[1] = 0.48203;
c_ox[1] = 1.22e-14;
mobility_eff[1] = 356.76 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[1] = 0.373;
c_g_ideal[1] = 9.15e-16;
c_fringe[1] = 0.08e-15;
c_junc[1] = 1e-15;
I_on_n[1] = 503.6e-6;
I_on_p[1] = 235.1e-6;
nmos_effective_resistance_multiplier = 1.92;
n_to_p_eff_curr_drv_ratio[1] = 2.44;
gmp_to_gmn_multiplier[1] = 0.88;
Rnchannelon[1] = nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
long_channel_leakage_reduction[1] = 1;
I_off_n[1][0] = 2.81e-12;
I_off_n[1][10] = 4.76e-12;
I_off_n[1][20] = 7.82e-12;
I_off_n[1][30] = 1.25e-11;
I_off_n[1][40] = 1.94e-11;
I_off_n[1][50] = 2.94e-11;
I_off_n[1][60] = 4.36e-11;
I_off_n[1][70] = 6.32e-11;
I_off_n[1][80] = 8.95e-11;
I_off_n[1][90] = 1.25e-10;
I_off_n[1][100] = 1.7e-10;
I_g_on_n[1][0] = 3.87e-11;//A/micron
I_g_on_n[1][10] = 3.87e-11;
I_g_on_n[1][20] = 3.87e-11;
I_g_on_n[1][30] = 3.87e-11;
I_g_on_n[1][40] = 3.87e-11;
I_g_on_n[1][50] = 3.87e-11;
I_g_on_n[1][60] = 3.87e-11;
I_g_on_n[1][70] = 3.87e-11;
I_g_on_n[1][80] = 3.87e-11;
I_g_on_n[1][90] = 3.87e-11;
I_g_on_n[1][100] = 3.87e-11;
//ITRS LOP device type
vdd[2] = 0.9;
Lphy[2] = 0.053;
Lelec[2] = 0.0354;
t_ox[2] = 1.5e-3;
v_th[2] = 0.30764;
c_ox[2] = 1.59e-14;
mobility_eff[2] = 460.39 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[2] = 0.113;
c_g_ideal[2] = 8.45e-16;
c_fringe[2] = 0.08e-15;
c_junc[2] = 1e-15;
I_on_n[2] = 386.6e-6;
I_on_p[2] = 209.7e-6;
nmos_effective_resistance_multiplier = 1.77;
n_to_p_eff_curr_drv_ratio[2] = 2.54;
gmp_to_gmn_multiplier[2] = 0.98;
Rnchannelon[2] = nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
long_channel_leakage_reduction[2] = 1;
I_off_n[2][0] = 2.14e-9;
I_off_n[2][10] = 2.9e-9;
I_off_n[2][20] = 3.87e-9;
I_off_n[2][30] = 5.07e-9;
I_off_n[2][40] = 6.54e-9;
I_off_n[2][50] = 8.27e-8;
I_off_n[2][60] = 1.02e-7;
I_off_n[2][70] = 1.20e-7;
I_off_n[2][80] = 1.36e-8;
I_off_n[2][90] = 1.52e-8;
I_off_n[2][100] = 1.73e-8;
I_g_on_n[2][0] = 4.31e-8;//A/micron
I_g_on_n[2][10] = 4.31e-8;
I_g_on_n[2][20] = 4.31e-8;
I_g_on_n[2][30] = 4.31e-8;
I_g_on_n[2][40] = 4.31e-8;
I_g_on_n[2][50] = 4.31e-8;
I_g_on_n[2][60] = 4.31e-8;
I_g_on_n[2][70] = 4.31e-8;
I_g_on_n[2][80] = 4.31e-8;
I_g_on_n[2][90] = 4.31e-8;
I_g_on_n[2][100] = 4.31e-8;
if (ram_cell_tech_type == lp_dram) {
//LP-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.2;
Lphy[3] = 0.12;
Lelec[3] = 0.0756;
curr_v_th_dram_access_transistor = 0.4545;
width_dram_access_transistor = 0.14;
curr_I_on_dram_cell = 45e-6;
curr_I_off_dram_cell_worst_case_length_temp = 21.1e-12;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 0.168;
curr_asp_ratio_cell_dram = 1.46;
curr_c_dram_cell = 20e-15;
//LP-DRAM wordline transistor parameters
curr_vpp = 1.6;
t_ox[3] = 2.2e-3;
v_th[3] = 0.4545;
c_ox[3] = 1.22e-14;
mobility_eff[3] = 323.95 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.3;
c_g_ideal[3] = 1.47e-15;
c_fringe[3] = 0.08e-15;
c_junc[3] = 1e-15;
I_on_n[3] = 321.6e-6;
I_on_p[3] = 203.3e-6;
nmos_effective_resistance_multiplier = 1.65;
n_to_p_eff_curr_drv_ratio[3] = 1.95;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 1.42e-11;
I_off_n[3][10] = 2.25e-11;
I_off_n[3][20] = 3.46e-11;
I_off_n[3][30] = 5.18e-11;
I_off_n[3][40] = 7.58e-11;
I_off_n[3][50] = 1.08e-10;
I_off_n[3][60] = 1.51e-10;
I_off_n[3][70] = 2.02e-10;
I_off_n[3][80] = 2.57e-10;
I_off_n[3][90] = 3.14e-10;
I_off_n[3][100] = 3.85e-10;
} else if (ram_cell_tech_type == comm_dram) {
//COMM-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.6;
Lphy[3] = 0.09;
Lelec[3] = 0.0576;
curr_v_th_dram_access_transistor = 1;
width_dram_access_transistor = 0.09;
curr_I_on_dram_cell = 20e-6;
curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 6 * 0.09 * 0.09;
curr_asp_ratio_cell_dram = 1.5;
curr_c_dram_cell = 30e-15;
//COMM-DRAM wordline transistor parameters
curr_vpp = 3.7;
t_ox[3] = 5.5e-3;
v_th[3] = 1.0;
c_ox[3] = 5.65e-15;
mobility_eff[3] = 302.2 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.32;
c_g_ideal[3] = 5.08e-16;
c_fringe[3] = 0.08e-15;
c_junc[3] = 1e-15;
I_on_n[3] = 1094.3e-6;
I_on_p[3] = I_on_n[3] / 2;
nmos_effective_resistance_multiplier = 1.62;
n_to_p_eff_curr_drv_ratio[3] = 2.05;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 5.80e-15;
I_off_n[3][10] = 1.21e-14;
I_off_n[3][20] = 2.42e-14;
I_off_n[3][30] = 4.65e-14;
I_off_n[3][40] = 8.60e-14;
I_off_n[3][50] = 1.54e-13;
I_off_n[3][60] = 2.66e-13;
I_off_n[3][70] = 4.45e-13;
I_off_n[3][80] = 7.17e-13;
I_off_n[3][90] = 1.11e-12;
I_off_n[3][100] = 1.67e-12;
}
//SRAM cell properties
curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_sram = 1.46;
//CAM cell properties //TODO: data need to be revisited
curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;//360
curr_asp_ratio_cell_cam = 2.92;//2.5
//Empirical undifferetiated core/FU coefficient
curr_logic_scaling_co_eff = 1;
curr_core_tx_density = 1.25 * 0.7 * 0.7;
curr_sckt_co_eff = 1.1539;
curr_chip_layout_overhead = 1.2;//die measurement results based on Niagara 1 and 2
curr_macro_layout_overhead = 1.1;//EDA placement and routing tool rule of thumb
}
if (tech == 65) {
//65nm technology-node. Corresponds to year 2007 in ITRS
//ITRS HP device type
SENSE_AMP_D = .2e-9; // s
SENSE_AMP_P = 5.7e-15; // J
vdd[0] = 1.1;
Lphy[0] = 0.025;
Lelec[0] = 0.019;
t_ox[0] = 1.1e-3;
v_th[0] = .19491;
c_ox[0] = 1.88e-14;
mobility_eff[0] = 436.24 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[0] = 7.71e-2;
c_g_ideal[0] = 4.69e-16;
c_fringe[0] = 0.077e-15;
c_junc[0] = 1e-15;
I_on_n[0] = 1197.2e-6;
I_on_p[0] = 870.8e-6;
nmos_effective_resistance_multiplier = 1.50;
n_to_p_eff_curr_drv_ratio[0] = 2.41;
gmp_to_gmn_multiplier[0] = 1.38;
Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];
Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];
long_channel_leakage_reduction[0] = 1 / 3.74;
//Using MASTAR, @380K, increase Lgate until Ion reduces to 90% or Lgate increase by 10%, whichever comes first
//Ioff(Lgate normal)/Ioff(Lgate long)= 3.74.
I_off_n[0][0] = 1.96e-7;
I_off_n[0][10] = 2.29e-7;
I_off_n[0][20] = 2.66e-7;
I_off_n[0][30] = 3.05e-7;
I_off_n[0][40] = 3.49e-7;
I_off_n[0][50] = 3.95e-7;
I_off_n[0][60] = 4.45e-7;
I_off_n[0][70] = 4.97e-7;
I_off_n[0][80] = 5.48e-7;
I_off_n[0][90] = 5.94e-7;
I_off_n[0][100] = 6.3e-7;
I_g_on_n[0][0] = 4.09e-8;//A/micron
I_g_on_n[0][10] = 4.09e-8;
I_g_on_n[0][20] = 4.09e-8;
I_g_on_n[0][30] = 4.09e-8;
I_g_on_n[0][40] = 4.09e-8;
I_g_on_n[0][50] = 4.09e-8;
I_g_on_n[0][60] = 4.09e-8;
I_g_on_n[0][70] = 4.09e-8;
I_g_on_n[0][80] = 4.09e-8;
I_g_on_n[0][90] = 4.09e-8;
I_g_on_n[0][100] = 4.09e-8;
//ITRS LSTP device type
vdd[1] = 1.2;
Lphy[1] = 0.045;
Lelec[1] = 0.0298;
t_ox[1] = 1.9e-3;
v_th[1] = 0.52354;
c_ox[1] = 1.36e-14;
mobility_eff[1] = 341.21 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[1] = 0.128;
c_g_ideal[1] = 6.14e-16;
c_fringe[1] = 0.08e-15;
c_junc[1] = 1e-15;
I_on_n[1] = 519.2e-6;
I_on_p[1] = 266e-6;
nmos_effective_resistance_multiplier = 1.96;
n_to_p_eff_curr_drv_ratio[1] = 2.23;
gmp_to_gmn_multiplier[1] = 0.99;
Rnchannelon[1] = nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
long_channel_leakage_reduction[1] = 1 / 2.82;
I_off_n[1][0] = 9.12e-12;
I_off_n[1][10] = 1.49e-11;
I_off_n[1][20] = 2.36e-11;
I_off_n[1][30] = 3.64e-11;
I_off_n[1][40] = 5.48e-11;
I_off_n[1][50] = 8.05e-11;
I_off_n[1][60] = 1.15e-10;
I_off_n[1][70] = 1.59e-10;
I_off_n[1][80] = 2.1e-10;
I_off_n[1][90] = 2.62e-10;
I_off_n[1][100] = 3.21e-10;
I_g_on_n[1][0] = 1.09e-10;//A/micron
I_g_on_n[1][10] = 1.09e-10;
I_g_on_n[1][20] = 1.09e-10;
I_g_on_n[1][30] = 1.09e-10;
I_g_on_n[1][40] = 1.09e-10;
I_g_on_n[1][50] = 1.09e-10;
I_g_on_n[1][60] = 1.09e-10;
I_g_on_n[1][70] = 1.09e-10;
I_g_on_n[1][80] = 1.09e-10;
I_g_on_n[1][90] = 1.09e-10;
I_g_on_n[1][100] = 1.09e-10;
//ITRS LOP device type
vdd[2] = 0.8;
Lphy[2] = 0.032;
Lelec[2] = 0.0216;
t_ox[2] = 1.2e-3;
v_th[2] = 0.28512;
c_ox[2] = 1.87e-14;
mobility_eff[2] = 495.19 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[2] = 0.292;
c_g_ideal[2] = 6e-16;
c_fringe[2] = 0.08e-15;
c_junc[2] = 1e-15;
I_on_n[2] = 573.1e-6;
I_on_p[2] = 340.6e-6;
nmos_effective_resistance_multiplier = 1.82;
n_to_p_eff_curr_drv_ratio[2] = 2.28;
gmp_to_gmn_multiplier[2] = 1.11;
Rnchannelon[2] = nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
long_channel_leakage_reduction[2] = 1 / 2.05;
I_off_n[2][0] = 4.9e-9;
I_off_n[2][10] = 6.49e-9;
I_off_n[2][20] = 8.45e-9;
I_off_n[2][30] = 1.08e-8;
I_off_n[2][40] = 1.37e-8;
I_off_n[2][50] = 1.71e-8;
I_off_n[2][60] = 2.09e-8;
I_off_n[2][70] = 2.48e-8;
I_off_n[2][80] = 2.84e-8;
I_off_n[2][90] = 3.13e-8;
I_off_n[2][100] = 3.42e-8;
I_g_on_n[2][0] = 9.61e-9;//A/micron
I_g_on_n[2][10] = 9.61e-9;
I_g_on_n[2][20] = 9.61e-9;
I_g_on_n[2][30] = 9.61e-9;
I_g_on_n[2][40] = 9.61e-9;
I_g_on_n[2][50] = 9.61e-9;
I_g_on_n[2][60] = 9.61e-9;
I_g_on_n[2][70] = 9.61e-9;
I_g_on_n[2][80] = 9.61e-9;
I_g_on_n[2][90] = 9.61e-9;
I_g_on_n[2][100] = 9.61e-9;
if (ram_cell_tech_type == lp_dram) {
//LP-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.2;
Lphy[3] = 0.12;
Lelec[3] = 0.0756;
curr_v_th_dram_access_transistor = 0.43806;
width_dram_access_transistor = 0.09;
curr_I_on_dram_cell = 36e-6;
curr_I_off_dram_cell_worst_case_length_temp = 19.6e-12;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 0.11;
curr_asp_ratio_cell_dram = 1.46;
curr_c_dram_cell = 20e-15;
//LP-DRAM wordline transistor parameters
curr_vpp = 1.6;
t_ox[3] = 2.2e-3;
v_th[3] = 0.43806;
c_ox[3] = 1.22e-14;
mobility_eff[3] = 328.32 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.43806;
c_g_ideal[3] = 1.46e-15;
c_fringe[3] = 0.08e-15;
c_junc[3] = 1e-15 ;
I_on_n[3] = 399.8e-6;
I_on_p[3] = 243.4e-6;
nmos_effective_resistance_multiplier = 1.65;
n_to_p_eff_curr_drv_ratio[3] = 2.05;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 2.23e-11;
I_off_n[3][10] = 3.46e-11;
I_off_n[3][20] = 5.24e-11;
I_off_n[3][30] = 7.75e-11;
I_off_n[3][40] = 1.12e-10;
I_off_n[3][50] = 1.58e-10;
I_off_n[3][60] = 2.18e-10;
I_off_n[3][70] = 2.88e-10;
I_off_n[3][80] = 3.63e-10;
I_off_n[3][90] = 4.41e-10;
I_off_n[3][100] = 5.36e-10;
} else if (ram_cell_tech_type == comm_dram) {
//COMM-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.3;
Lphy[3] = 0.065;
Lelec[3] = 0.0426;
curr_v_th_dram_access_transistor = 1;
width_dram_access_transistor = 0.065;
curr_I_on_dram_cell = 20e-6;
curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 6 * 0.065 * 0.065;
curr_asp_ratio_cell_dram = 1.5;
curr_c_dram_cell = 30e-15;
//COMM-DRAM wordline transistor parameters
curr_vpp = 3.3;
t_ox[3] = 5e-3;
v_th[3] = 1.0;
c_ox[3] = 6.16e-15;
mobility_eff[3] = 303.44 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.385;
c_g_ideal[3] = 4e-16;
c_fringe[3] = 0.08e-15;
c_junc[3] = 1e-15 ;
I_on_n[3] = 1031e-6;
I_on_p[3] = I_on_n[3] / 2;
nmos_effective_resistance_multiplier = 1.69;
n_to_p_eff_curr_drv_ratio[3] = 2.39;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 1.80e-14;
I_off_n[3][10] = 3.64e-14;
I_off_n[3][20] = 7.03e-14;
I_off_n[3][30] = 1.31e-13;
I_off_n[3][40] = 2.35e-13;
I_off_n[3][50] = 4.09e-13;
I_off_n[3][60] = 6.89e-13;
I_off_n[3][70] = 1.13e-12;
I_off_n[3][80] = 1.78e-12;
I_off_n[3][90] = 2.71e-12;
I_off_n[3][100] = 3.99e-12;
}
//SRAM cell properties
curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_sram = 1.46;
//CAM cell properties //TODO: data need to be revisited
curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_cam = 2.92;
//Empirical undifferetiated core/FU coefficient
curr_logic_scaling_co_eff = 0.7; //Rather than scale proportionally to square of feature size, only scale linearly according to IBM cell processor
curr_core_tx_density = 1.25 * 0.7;
curr_sckt_co_eff = 1.1359;
curr_chip_layout_overhead = 1.2;//die measurement results based on Niagara 1 and 2
curr_macro_layout_overhead = 1.1;//EDA placement and routing tool rule of thumb
}
if (tech == 45) {
//45nm technology-node. Corresponds to year 2010 in ITRS
//ITRS HP device type
SENSE_AMP_D = .04e-9; // s
SENSE_AMP_P = 2.7e-15; // J
vdd[0] = 1.0;
Lphy[0] = 0.018;
Lelec[0] = 0.01345;
t_ox[0] = 0.65e-3;
v_th[0] = .18035;
c_ox[0] = 3.77e-14;
mobility_eff[0] = 266.68 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[0] = 9.38E-2;
c_g_ideal[0] = 6.78e-16;
c_fringe[0] = 0.05e-15;
c_junc[0] = 1e-15;
I_on_n[0] = 2046.6e-6;
//There are certain problems with the ITRS PMOS numbers in MASTAR for 45nm. So we are using 65nm values of
//n_to_p_eff_curr_drv_ratio and gmp_to_gmn_multiplier for 45nm
I_on_p[0] = I_on_n[0] / 2;//This value is fixed arbitrarily but I_on_p is not being used in CACTI
nmos_effective_resistance_multiplier = 1.51;
n_to_p_eff_curr_drv_ratio[0] = 2.41;
gmp_to_gmn_multiplier[0] = 1.38;
Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];
Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];
//Using MASTAR, @380K, increase Lgate until Ion reduces to 90%,
//Ioff(Lgate normal)/Ioff(Lgate long)= 3.74
long_channel_leakage_reduction[0] = 1 / 3.546;
I_off_n[0][0] = 2.8e-7;
I_off_n[0][10] = 3.28e-7;
I_off_n[0][20] = 3.81e-7;
I_off_n[0][30] = 4.39e-7;
I_off_n[0][40] = 5.02e-7;
I_off_n[0][50] = 5.69e-7;
I_off_n[0][60] = 6.42e-7;
I_off_n[0][70] = 7.2e-7;
I_off_n[0][80] = 8.03e-7;
I_off_n[0][90] = 8.91e-7;
I_off_n[0][100] = 9.84e-7;
I_g_on_n[0][0] = 3.59e-8;//A/micron
I_g_on_n[0][10] = 3.59e-8;
I_g_on_n[0][20] = 3.59e-8;
I_g_on_n[0][30] = 3.59e-8;
I_g_on_n[0][40] = 3.59e-8;
I_g_on_n[0][50] = 3.59e-8;
I_g_on_n[0][60] = 3.59e-8;
I_g_on_n[0][70] = 3.59e-8;
I_g_on_n[0][80] = 3.59e-8;
I_g_on_n[0][90] = 3.59e-8;
I_g_on_n[0][100] = 3.59e-8;
//ITRS LSTP device type
vdd[1] = 1.1;
Lphy[1] = 0.028;
Lelec[1] = 0.0212;
t_ox[1] = 1.4e-3;
v_th[1] = 0.50245;
c_ox[1] = 2.01e-14;
mobility_eff[1] = 363.96 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[1] = 9.12e-2;
c_g_ideal[1] = 5.18e-16;
c_fringe[1] = 0.08e-15;
c_junc[1] = 1e-15;
I_on_n[1] = 666.2e-6;
I_on_p[1] = I_on_n[1] / 2;
nmos_effective_resistance_multiplier = 1.99;
n_to_p_eff_curr_drv_ratio[1] = 2.23;
gmp_to_gmn_multiplier[1] = 0.99;
Rnchannelon[1] = nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
long_channel_leakage_reduction[1] = 1 / 2.08;
I_off_n[1][0] = 1.01e-11;
I_off_n[1][10] = 1.65e-11;
I_off_n[1][20] = 2.62e-11;
I_off_n[1][30] = 4.06e-11;
I_off_n[1][40] = 6.12e-11;
I_off_n[1][50] = 9.02e-11;
I_off_n[1][60] = 1.3e-10;
I_off_n[1][70] = 1.83e-10;
I_off_n[1][80] = 2.51e-10;
I_off_n[1][90] = 3.29e-10;
I_off_n[1][100] = 4.1e-10;
I_g_on_n[1][0] = 9.47e-12;//A/micron
I_g_on_n[1][10] = 9.47e-12;
I_g_on_n[1][20] = 9.47e-12;
I_g_on_n[1][30] = 9.47e-12;
I_g_on_n[1][40] = 9.47e-12;
I_g_on_n[1][50] = 9.47e-12;
I_g_on_n[1][60] = 9.47e-12;
I_g_on_n[1][70] = 9.47e-12;
I_g_on_n[1][80] = 9.47e-12;
I_g_on_n[1][90] = 9.47e-12;
I_g_on_n[1][100] = 9.47e-12;
//ITRS LOP device type
vdd[2] = 0.7;
Lphy[2] = 0.022;
Lelec[2] = 0.016;
t_ox[2] = 0.9e-3;
v_th[2] = 0.22599;
c_ox[2] = 2.82e-14;//F/micron2
mobility_eff[2] = 508.9 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[2] = 5.71e-2;
c_g_ideal[2] = 6.2e-16;
c_fringe[2] = 0.073e-15;
c_junc[2] = 1e-15;
I_on_n[2] = 748.9e-6;
I_on_p[2] = I_on_n[2] / 2;
nmos_effective_resistance_multiplier = 1.76;
n_to_p_eff_curr_drv_ratio[2] = 2.28;
gmp_to_gmn_multiplier[2] = 1.11;
Rnchannelon[2] = nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
long_channel_leakage_reduction[2] = 1 / 1.92;
I_off_n[2][0] = 4.03e-9;
I_off_n[2][10] = 5.02e-9;
I_off_n[2][20] = 6.18e-9;
I_off_n[2][30] = 7.51e-9;
I_off_n[2][40] = 9.04e-9;
I_off_n[2][50] = 1.08e-8;
I_off_n[2][60] = 1.27e-8;
I_off_n[2][70] = 1.47e-8;
I_off_n[2][80] = 1.66e-8;
I_off_n[2][90] = 1.84e-8;
I_off_n[2][100] = 2.03e-8;
I_g_on_n[2][0] = 3.24e-8;//A/micron
I_g_on_n[2][10] = 4.01e-8;
I_g_on_n[2][20] = 4.90e-8;
I_g_on_n[2][30] = 5.92e-8;
I_g_on_n[2][40] = 7.08e-8;
I_g_on_n[2][50] = 8.38e-8;
I_g_on_n[2][60] = 9.82e-8;
I_g_on_n[2][70] = 1.14e-7;
I_g_on_n[2][80] = 1.29e-7;
I_g_on_n[2][90] = 1.43e-7;
I_g_on_n[2][100] = 1.54e-7;
if (ram_cell_tech_type == lp_dram) {
//LP-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.1;
Lphy[3] = 0.078;
Lelec[3] = 0.0504;// Assume Lelec is 30% lesser than Lphy for DRAM access and wordline transistors.
curr_v_th_dram_access_transistor = 0.44559;
width_dram_access_transistor = 0.079;
curr_I_on_dram_cell = 36e-6;//A
curr_I_off_dram_cell_worst_case_length_temp = 19.5e-12;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = width_dram_access_transistor * Lphy[3] * 10.0;
curr_asp_ratio_cell_dram = 1.46;
curr_c_dram_cell = 20e-15;
//LP-DRAM wordline transistor parameters
curr_vpp = 1.5;
t_ox[3] = 2.1e-3;
v_th[3] = 0.44559;
c_ox[3] = 1.41e-14;
mobility_eff[3] = 426.30 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.181;
c_g_ideal[3] = 1.10e-15;
c_fringe[3] = 0.08e-15;
c_junc[3] = 1e-15;
I_on_n[3] = 456e-6;
I_on_p[3] = I_on_n[3] / 2;
nmos_effective_resistance_multiplier = 1.65;
n_to_p_eff_curr_drv_ratio[3] = 2.05;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 2.54e-11;
I_off_n[3][10] = 3.94e-11;
I_off_n[3][20] = 5.95e-11;
I_off_n[3][30] = 8.79e-11;
I_off_n[3][40] = 1.27e-10;
I_off_n[3][50] = 1.79e-10;
I_off_n[3][60] = 2.47e-10;
I_off_n[3][70] = 3.31e-10;
I_off_n[3][80] = 4.26e-10;
I_off_n[3][90] = 5.27e-10;
I_off_n[3][100] = 6.46e-10;
} else if (ram_cell_tech_type == comm_dram) {
//COMM-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.1;
Lphy[3] = 0.045;
Lelec[3] = 0.0298;
curr_v_th_dram_access_transistor = 1;
width_dram_access_transistor = 0.045;
curr_I_on_dram_cell = 20e-6;//A
curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 6 * 0.045 * 0.045;
curr_asp_ratio_cell_dram = 1.5;
curr_c_dram_cell = 30e-15;
//COMM-DRAM wordline transistor parameters
curr_vpp = 2.7;
t_ox[3] = 4e-3;
v_th[3] = 1.0;
c_ox[3] = 7.98e-15;
mobility_eff[3] = 368.58 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.147;
c_g_ideal[3] = 3.59e-16;
c_fringe[3] = 0.08e-15;
c_junc[3] = 1e-15;
I_on_n[3] = 999.4e-6;
I_on_p[3] = I_on_n[3] / 2;
nmos_effective_resistance_multiplier = 1.69;
n_to_p_eff_curr_drv_ratio[3] = 1.95;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 1.31e-14;
I_off_n[3][10] = 2.68e-14;
I_off_n[3][20] = 5.25e-14;
I_off_n[3][30] = 9.88e-14;
I_off_n[3][40] = 1.79e-13;
I_off_n[3][50] = 3.15e-13;
I_off_n[3][60] = 5.36e-13;
I_off_n[3][70] = 8.86e-13;
I_off_n[3][80] = 1.42e-12;
I_off_n[3][90] = 2.20e-12;
I_off_n[3][100] = 3.29e-12;
}
//SRAM cell properties
curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_sram = 1.46;
//CAM cell properties //TODO: data need to be revisited
curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_cam = 2.92;
//Empirical undifferetiated core/FU coefficient
curr_logic_scaling_co_eff = 0.7 * 0.7;
curr_core_tx_density = 1.25;
curr_sckt_co_eff = 1.1387;
curr_chip_layout_overhead = 1.2;//die measurement results based on Niagara 1 and 2
curr_macro_layout_overhead = 1.1;//EDA placement and routing tool rule of thumb
}
if (tech == 32) {
SENSE_AMP_D = .03e-9; // s
SENSE_AMP_P = 2.16e-15; // J
//For 2013, MPU/ASIC stagger-contacted M1 half-pitch is 32 nm (so this is 32 nm
//technology i.e. FEATURESIZE = 0.032). Using the SOI process numbers for
//HP and LSTP.
vdd[0] = 0.9;
Lphy[0] = 0.013;
Lelec[0] = 0.01013;
t_ox[0] = 0.5e-3;
v_th[0] = 0.21835;
c_ox[0] = 4.11e-14;
mobility_eff[0] = 361.84 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[0] = 5.09E-2;
c_g_ideal[0] = 5.34e-16;
c_fringe[0] = 0.04e-15;
c_junc[0] = 1e-15;
I_on_n[0] = 2211.7e-6;
I_on_p[0] = I_on_n[0] / 2;
nmos_effective_resistance_multiplier = 1.49;
n_to_p_eff_curr_drv_ratio[0] = 2.41;
gmp_to_gmn_multiplier[0] = 1.38;
Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];//ohm-micron
Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];//ohm-micron
long_channel_leakage_reduction[0] = 1 / 3.706;
//Using MASTAR, @300K (380K does not work in MASTAR), increase Lgate until Ion reduces to 95% or Lgate increase by 5% (DG device can only increase by 5%),
//whichever comes first
I_off_n[0][0] = 1.52e-7;
I_off_n[0][10] = 1.55e-7;
I_off_n[0][20] = 1.59e-7;
I_off_n[0][30] = 1.68e-7;
I_off_n[0][40] = 1.90e-7;
I_off_n[0][50] = 2.69e-7;
I_off_n[0][60] = 5.32e-7;
I_off_n[0][70] = 1.02e-6;
I_off_n[0][80] = 1.62e-6;
I_off_n[0][90] = 2.73e-6;
I_off_n[0][100] = 6.1e-6;
I_g_on_n[0][0] = 6.55e-8;//A/micron
I_g_on_n[0][10] = 6.55e-8;
I_g_on_n[0][20] = 6.55e-8;
I_g_on_n[0][30] = 6.55e-8;
I_g_on_n[0][40] = 6.55e-8;
I_g_on_n[0][50] = 6.55e-8;
I_g_on_n[0][60] = 6.55e-8;
I_g_on_n[0][70] = 6.55e-8;
I_g_on_n[0][80] = 6.55e-8;
I_g_on_n[0][90] = 6.55e-8;
I_g_on_n[0][100] = 6.55e-8;
//LSTP device type
vdd[1] = 1;
Lphy[1] = 0.020;
Lelec[1] = 0.0173;
t_ox[1] = 1.2e-3;
v_th[1] = 0.513;
c_ox[1] = 2.29e-14;
mobility_eff[1] = 347.46 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[1] = 8.64e-2;
c_g_ideal[1] = 4.58e-16;
c_fringe[1] = 0.053e-15;
c_junc[1] = 1e-15;
I_on_n[1] = 683.6e-6;
I_on_p[1] = I_on_n[1] / 2;
nmos_effective_resistance_multiplier = 1.99;
n_to_p_eff_curr_drv_ratio[1] = 2.23;
gmp_to_gmn_multiplier[1] = 0.99;
Rnchannelon[1] = nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
long_channel_leakage_reduction[1] = 1 / 1.93;
I_off_n[1][0] = 2.06e-11;
I_off_n[1][10] = 3.30e-11;
I_off_n[1][20] = 5.15e-11;
I_off_n[1][30] = 7.83e-11;
I_off_n[1][40] = 1.16e-10;
I_off_n[1][50] = 1.69e-10;
I_off_n[1][60] = 2.40e-10;
I_off_n[1][70] = 3.34e-10;
I_off_n[1][80] = 4.54e-10;
I_off_n[1][90] = 5.96e-10;
I_off_n[1][100] = 7.44e-10;
I_g_on_n[1][0] = 3.73e-11;//A/micron
I_g_on_n[1][10] = 3.73e-11;
I_g_on_n[1][20] = 3.73e-11;
I_g_on_n[1][30] = 3.73e-11;
I_g_on_n[1][40] = 3.73e-11;
I_g_on_n[1][50] = 3.73e-11;
I_g_on_n[1][60] = 3.73e-11;
I_g_on_n[1][70] = 3.73e-11;
I_g_on_n[1][80] = 3.73e-11;
I_g_on_n[1][90] = 3.73e-11;
I_g_on_n[1][100] = 3.73e-11;
//LOP device type
vdd[2] = 0.6;
Lphy[2] = 0.016;
Lelec[2] = 0.01232;
t_ox[2] = 0.9e-3;
v_th[2] = 0.24227;
c_ox[2] = 2.84e-14;
mobility_eff[2] = 513.52 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[2] = 4.64e-2;
c_g_ideal[2] = 4.54e-16;
c_fringe[2] = 0.057e-15;
c_junc[2] = 1e-15;
I_on_n[2] = 827.8e-6;
I_on_p[2] = I_on_n[2] / 2;
nmos_effective_resistance_multiplier = 1.73;
n_to_p_eff_curr_drv_ratio[2] = 2.28;
gmp_to_gmn_multiplier[2] = 1.11;
Rnchannelon[2] = nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
long_channel_leakage_reduction[2] = 1 / 1.89;
I_off_n[2][0] = 5.94e-8;
I_off_n[2][10] = 7.23e-8;
I_off_n[2][20] = 8.7e-8;
I_off_n[2][30] = 1.04e-7;
I_off_n[2][40] = 1.22e-7;
I_off_n[2][50] = 1.43e-7;
I_off_n[2][60] = 1.65e-7;
I_off_n[2][70] = 1.90e-7;
I_off_n[2][80] = 2.15e-7;
I_off_n[2][90] = 2.39e-7;
I_off_n[2][100] = 2.63e-7;
I_g_on_n[2][0] = 2.93e-9;//A/micron
I_g_on_n[2][10] = 2.93e-9;
I_g_on_n[2][20] = 2.93e-9;
I_g_on_n[2][30] = 2.93e-9;
I_g_on_n[2][40] = 2.93e-9;
I_g_on_n[2][50] = 2.93e-9;
I_g_on_n[2][60] = 2.93e-9;
I_g_on_n[2][70] = 2.93e-9;
I_g_on_n[2][80] = 2.93e-9;
I_g_on_n[2][90] = 2.93e-9;
I_g_on_n[2][100] = 2.93e-9;
if (ram_cell_tech_type == lp_dram) {
//LP-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.0;
Lphy[3] = 0.056;
Lelec[3] = 0.0419;//Assume Lelec is 30% lesser than Lphy for DRAM access and wordline transistors.
curr_v_th_dram_access_transistor = 0.44129;
width_dram_access_transistor = 0.056;
curr_I_on_dram_cell = 36e-6;
curr_I_off_dram_cell_worst_case_length_temp = 18.9e-12;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = width_dram_access_transistor * Lphy[3] * 10.0;
curr_asp_ratio_cell_dram = 1.46;
curr_c_dram_cell = 20e-15;
//LP-DRAM wordline transistor parameters
curr_vpp = 1.5;
t_ox[3] = 2e-3;
v_th[3] = 0.44467;
c_ox[3] = 1.48e-14;
mobility_eff[3] = 408.12 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.174;
c_g_ideal[3] = 7.45e-16;
c_fringe[3] = 0.053e-15;
c_junc[3] = 1e-15;
I_on_n[3] = 1055.4e-6;
I_on_p[3] = I_on_n[3] / 2;
nmos_effective_resistance_multiplier = 1.65;
n_to_p_eff_curr_drv_ratio[3] = 2.05;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 3.57e-11;
I_off_n[3][10] = 5.51e-11;
I_off_n[3][20] = 8.27e-11;
I_off_n[3][30] = 1.21e-10;
I_off_n[3][40] = 1.74e-10;
I_off_n[3][50] = 2.45e-10;
I_off_n[3][60] = 3.38e-10;
I_off_n[3][70] = 4.53e-10;
I_off_n[3][80] = 5.87e-10;
I_off_n[3][90] = 7.29e-10;
I_off_n[3][100] = 8.87e-10;
} else if (ram_cell_tech_type == comm_dram) {
//COMM-DRAM cell access transistor technology parameters
curr_vdd_dram_cell = 1.0;
Lphy[3] = 0.032;
Lelec[3] = 0.0205;//Assume Lelec is 30% lesser than Lphy for DRAM access and wordline transistors.
curr_v_th_dram_access_transistor = 1;
width_dram_access_transistor = 0.032;
curr_I_on_dram_cell = 20e-6;
curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 6 * 0.032 * 0.032;
curr_asp_ratio_cell_dram = 1.5;
curr_c_dram_cell = 30e-15;
//COMM-DRAM wordline transistor parameters
curr_vpp = 2.6;
t_ox[3] = 4e-3;
v_th[3] = 1.0;
c_ox[3] = 7.99e-15;
mobility_eff[3] = 380.76 * (1e-2 * 1e6 * 1e-2 * 1e6);
Vdsat[3] = 0.129;
c_g_ideal[3] = 2.56e-16;
c_fringe[3] = 0.053e-15;
c_junc[3] = 1e-15;
I_on_n[3] = 1024.5e-6;
I_on_p[3] = I_on_n[3] / 2;
nmos_effective_resistance_multiplier = 1.69;
n_to_p_eff_curr_drv_ratio[3] = 1.95;
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 3.63e-14;
I_off_n[3][10] = 7.18e-14;
I_off_n[3][20] = 1.36e-13;
I_off_n[3][30] = 2.49e-13;
I_off_n[3][40] = 4.41e-13;
I_off_n[3][50] = 7.55e-13;
I_off_n[3][60] = 1.26e-12;
I_off_n[3][70] = 2.03e-12;
I_off_n[3][80] = 3.19e-12;
I_off_n[3][90] = 4.87e-12;
I_off_n[3][100] = 7.16e-12;
}
//SRAM cell properties
curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_sram = 1.46;
//CAM cell properties //TODO: data need to be revisited
curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_cam = 2.92;
//Empirical undifferetiated core/FU coefficient
curr_logic_scaling_co_eff = 0.7 * 0.7 * 0.7;
curr_core_tx_density = 1.25 / 0.7;
curr_sckt_co_eff = 1.1111;
curr_chip_layout_overhead = 1.2;//die measurement results based on Niagara 1 and 2
curr_macro_layout_overhead = 1.1;//EDA placement and routing tool rule of thumb
}
if (tech == 22) {
SENSE_AMP_D = .03e-9; // s
SENSE_AMP_P = 2.16e-15; // J
//For 2016, MPU/ASIC stagger-contacted M1 half-pitch is 22 nm (so this is 22 nm
//technology i.e. FEATURESIZE = 0.022). Using the DG process numbers for HP.
//22 nm HP
vdd[0] = 0.8;
Lphy[0] = 0.009;//Lphy is the physical gate-length.
Lelec[0] = 0.00468;//Lelec is the electrical gate-length.
t_ox[0] = 0.55e-3;//micron
v_th[0] = 0.1395;//V
c_ox[0] = 3.63e-14;//F/micron2
mobility_eff[0] = 426.07 * (1e-2 * 1e6 * 1e-2 * 1e6); //micron2 / Vs
Vdsat[0] = 2.33e-2; //V/micron
c_g_ideal[0] = 3.27e-16;//F/micron
c_fringe[0] = 0.06e-15;//F/micron
c_junc[0] = 0;//F/micron2
I_on_n[0] = 2626.4e-6;//A/micron
I_on_p[0] = I_on_n[0] / 2;//A/micron //This value for I_on_p is not really used.
nmos_effective_resistance_multiplier = 1.45;
n_to_p_eff_curr_drv_ratio[0] = 2; //Wpmos/Wnmos = 2 in 2007 MASTAR. Look in
//"Dynamic" tab of Device workspace.
gmp_to_gmn_multiplier[0] = 1.38; //Just using the 32nm SOI value.
Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];//ohm-micron
Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];//ohm-micron
long_channel_leakage_reduction[0] = 1 / 3.274;
//From 22nm, leakage current are directly from ITRS report rather
//than MASTAR, since MASTAR has serious bugs there.
I_off_n[0][0] = 1.52e-7 / 1.5 * 1.2;
I_off_n[0][10] = 1.55e-7 / 1.5 * 1.2;
I_off_n[0][20] = 1.59e-7 / 1.5 * 1.2;
I_off_n[0][30] = 1.68e-7 / 1.5 * 1.2;
I_off_n[0][40] = 1.90e-7 / 1.5 * 1.2;
I_off_n[0][50] = 2.69e-7 / 1.5 * 1.2;
I_off_n[0][60] = 5.32e-7 / 1.5 * 1.2;
I_off_n[0][70] = 1.02e-6 / 1.5 * 1.2;
I_off_n[0][80] = 1.62e-6 / 1.5 * 1.2;
I_off_n[0][90] = 2.73e-6 / 1.5 * 1.2;
I_off_n[0][100] = 6.1e-6 / 1.5 * 1.2;
//for 22nm DG HP
I_g_on_n[0][0] = 1.81e-9;//A/micron
I_g_on_n[0][10] = 1.81e-9;
I_g_on_n[0][20] = 1.81e-9;
I_g_on_n[0][30] = 1.81e-9;
I_g_on_n[0][40] = 1.81e-9;
I_g_on_n[0][50] = 1.81e-9;
I_g_on_n[0][60] = 1.81e-9;
I_g_on_n[0][70] = 1.81e-9;
I_g_on_n[0][80] = 1.81e-9;
I_g_on_n[0][90] = 1.81e-9;
I_g_on_n[0][100] = 1.81e-9;
//22 nm LSTP DG
vdd[1] = 0.8;
Lphy[1] = 0.014;
Lelec[1] = 0.008;//Lelec is the electrical gate-length.
t_ox[1] = 1.1e-3;//micron
v_th[1] = 0.40126;//V
c_ox[1] = 2.30e-14;//F/micron2
mobility_eff[1] = 738.09 * (1e-2 * 1e6 * 1e-2 * 1e6); //micron2 / Vs
Vdsat[1] = 6.64e-2; //V/micron
c_g_ideal[1] = 3.22e-16;//F/micron
c_fringe[1] = 0.08e-15;
c_junc[1] = 0;//F/micron2
I_on_n[1] = 727.6e-6;//A/micron
I_on_p[1] = I_on_n[1] / 2;
nmos_effective_resistance_multiplier = 1.99;
n_to_p_eff_curr_drv_ratio[1] = 2;
gmp_to_gmn_multiplier[1] = 0.99;
Rnchannelon[1] = nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];//ohm-micron
Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];//ohm-micron
long_channel_leakage_reduction[1] = 1 / 1.89;
I_off_n[1][0] = 2.43e-11;
I_off_n[1][10] = 4.85e-11;
I_off_n[1][20] = 9.68e-11;
I_off_n[1][30] = 1.94e-10;
I_off_n[1][40] = 3.87e-10;
I_off_n[1][50] = 7.73e-10;
I_off_n[1][60] = 3.55e-10;
I_off_n[1][70] = 3.09e-9;
I_off_n[1][80] = 6.19e-9;
I_off_n[1][90] = 1.24e-8;
I_off_n[1][100] = 2.48e-8;
I_g_on_n[1][0] = 4.51e-10;//A/micron
I_g_on_n[1][10] = 4.51e-10;
I_g_on_n[1][20] = 4.51e-10;
I_g_on_n[1][30] = 4.51e-10;
I_g_on_n[1][40] = 4.51e-10;
I_g_on_n[1][50] = 4.51e-10;
I_g_on_n[1][60] = 4.51e-10;
I_g_on_n[1][70] = 4.51e-10;
I_g_on_n[1][80] = 4.51e-10;
I_g_on_n[1][90] = 4.51e-10;
I_g_on_n[1][100] = 4.51e-10;
//22 nm LOP
vdd[2] = 0.6;
Lphy[2] = 0.011;
Lelec[2] = 0.00604;//Lelec is the electrical gate-length.
t_ox[2] = 0.8e-3;//micron
v_th[2] = 0.2315;//V
c_ox[2] = 2.87e-14;//F/micron2
mobility_eff[2] = 698.37 * (1e-2 * 1e6 * 1e-2 * 1e6); //micron2 / Vs
Vdsat[2] = 1.81e-2; //V/micron
c_g_ideal[2] = 3.16e-16;//F/micron
c_fringe[2] = 0.08e-15;
c_junc[2] = 0;//F/micron2 This is Cj0 not Cjunc in MASTAR results->Dynamic Tab
I_on_n[2] = 916.1e-6;//A/micron
I_on_p[2] = I_on_n[2] / 2;
nmos_effective_resistance_multiplier = 1.73;
n_to_p_eff_curr_drv_ratio[2] = 2;
gmp_to_gmn_multiplier[2] = 1.11;
Rnchannelon[2] = nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];//ohm-micron
Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];//ohm-micron
long_channel_leakage_reduction[2] = 1 / 2.38;
I_off_n[2][0] = 1.31e-8;
I_off_n[2][10] = 2.60e-8;
I_off_n[2][20] = 5.14e-8;
I_off_n[2][30] = 1.02e-7;
I_off_n[2][40] = 2.02e-7;
I_off_n[2][50] = 3.99e-7;
I_off_n[2][60] = 7.91e-7;
I_off_n[2][70] = 1.09e-6;
I_off_n[2][80] = 2.09e-6;
I_off_n[2][90] = 4.04e-6;
I_off_n[2][100] = 4.48e-6;
I_g_on_n[2][0] = 2.74e-9;//A/micron
I_g_on_n[2][10] = 2.74e-9;
I_g_on_n[2][20] = 2.74e-9;
I_g_on_n[2][30] = 2.74e-9;
I_g_on_n[2][40] = 2.74e-9;
I_g_on_n[2][50] = 2.74e-9;
I_g_on_n[2][60] = 2.74e-9;
I_g_on_n[2][70] = 2.74e-9;
I_g_on_n[2][80] = 2.74e-9;
I_g_on_n[2][90] = 2.74e-9;
I_g_on_n[2][100] = 2.74e-9;
if (ram_cell_tech_type == 3) {} else if (ram_cell_tech_type == 4) {
//22 nm commodity DRAM cell access transistor technology parameters.
//parameters
curr_vdd_dram_cell = 0.9;//0.45;//This value has reduced greatly in 2007 ITRS for all technology nodes. In
//2005 ITRS, the value was about twice the value in 2007 ITRS
Lphy[3] = 0.022;//micron
Lelec[3] = 0.0181;//micron.
curr_v_th_dram_access_transistor = 1;//V
width_dram_access_transistor = 0.022;//micron
curr_I_on_dram_cell = 20e-6; //This is a typical value that I have always
//kept constant. In reality this could perhaps be lower
curr_I_off_dram_cell_worst_case_length_temp = 1e-15;//A
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 6 * 0.022 * 0.022;//micron2.
curr_asp_ratio_cell_dram = 0.667;
curr_c_dram_cell = 30e-15;//This is a typical value that I have alwaus
//kept constant.
//22 nm commodity DRAM wordline transistor parameters obtained using MASTAR.
curr_vpp = 2.3;//vpp. V
t_ox[3] = 3.5e-3;//micron
v_th[3] = 1.0;//V
c_ox[3] = 9.06e-15;//F/micron2
mobility_eff[3] = 367.29 * (1e-2 * 1e6 * 1e-2 * 1e6);//micron2 / Vs
Vdsat[3] = 0.0972; //V/micron
c_g_ideal[3] = 1.99e-16;//F/micron
c_fringe[3] = 0.053e-15;//F/micron
c_junc[3] = 1e-15;//F/micron2
I_on_n[3] = 910.5e-6;//A/micron
I_on_p[3] = I_on_n[3] / 2;//This value for I_on_p is not really used.
nmos_effective_resistance_multiplier = 1.69;//Using the value from 32nm.
//
n_to_p_eff_curr_drv_ratio[3] = 1.95;//Using the value from 32nm
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];//ohm-micron
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];//ohm-micron
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 1.1e-13; //A/micron
I_off_n[3][10] = 2.11e-13;
I_off_n[3][20] = 3.88e-13;
I_off_n[3][30] = 6.9e-13;
I_off_n[3][40] = 1.19e-12;
I_off_n[3][50] = 1.98e-12;
I_off_n[3][60] = 3.22e-12;
I_off_n[3][70] = 5.09e-12;
I_off_n[3][80] = 7.85e-12;
I_off_n[3][90] = 1.18e-11;
I_off_n[3][100] = 1.72e-11;
} else {
//some error handler
}
//SRAM cell properties
curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_sram = 1.46;
//CAM cell properties //TODO: data need to be revisited
curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_cam = 2.92;
//Empirical undifferetiated core/FU coefficient
curr_logic_scaling_co_eff = 0.7 * 0.7 * 0.7 * 0.7;
curr_core_tx_density = 1.25 / 0.7 / 0.7;
curr_sckt_co_eff = 1.1296;
curr_chip_layout_overhead = 1.2;//die measurement results based on Niagara 1 and 2
curr_macro_layout_overhead = 1.1;//EDA placement and routing tool rule of thumb
}
if (tech == 16) {
//For 2019, MPU/ASIC stagger-contacted M1 half-pitch is 16 nm (so this is 16 nm
//technology i.e. FEATURESIZE = 0.016). Using the DG process numbers for HP.
//16 nm HP
vdd[0] = 0.7;
Lphy[0] = 0.006;//Lphy is the physical gate-length.
Lelec[0] = 0.00315;//Lelec is the electrical gate-length.
t_ox[0] = 0.5e-3;//micron
v_th[0] = 0.1489;//V
c_ox[0] = 3.83e-14;//F/micron2 Cox_elec in MASTAR
mobility_eff[0] = 476.15 * (1e-2 * 1e6 * 1e-2 * 1e6); //micron2 / Vs
Vdsat[0] = 1.42e-2; //V/micron calculated in spreadsheet
c_g_ideal[0] = 2.30e-16;//F/micron
c_fringe[0] = 0.06e-15;//F/micron MASTAR inputdynamic/3
c_junc[0] = 0;//F/micron2 MASTAR result dynamic
I_on_n[0] = 2768.4e-6;//A/micron
I_on_p[0] = I_on_n[0] / 2;//A/micron //This value for I_on_p is not really used.
nmos_effective_resistance_multiplier = 1.48;//nmos_effective_resistance_multiplier is the ratio of Ieff to Idsat where Ieff is the effective NMOS current and Idsat is the saturation current.
n_to_p_eff_curr_drv_ratio[0] = 2; //Wpmos/Wnmos = 2 in 2007 MASTAR. Look in
//"Dynamic" tab of Device workspace.
gmp_to_gmn_multiplier[0] = 1.38; //Just using the 32nm SOI value.
Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];//ohm-micron
Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];//ohm-micron
long_channel_leakage_reduction[0] = 1 / 2.655;
I_off_n[0][0] = 1.52e-7 / 1.5 * 1.2 * 1.07;
I_off_n[0][10] = 1.55e-7 / 1.5 * 1.2 * 1.07;
I_off_n[0][20] = 1.59e-7 / 1.5 * 1.2 * 1.07;
I_off_n[0][30] = 1.68e-7 / 1.5 * 1.2 * 1.07;
I_off_n[0][40] = 1.90e-7 / 1.5 * 1.2 * 1.07;
I_off_n[0][50] = 2.69e-7 / 1.5 * 1.2 * 1.07;
I_off_n[0][60] = 5.32e-7 / 1.5 * 1.2 * 1.07;
I_off_n[0][70] = 1.02e-6 / 1.5 * 1.2 * 1.07;
I_off_n[0][80] = 1.62e-6 / 1.5 * 1.2 * 1.07;
I_off_n[0][90] = 2.73e-6 / 1.5 * 1.2 * 1.07;
I_off_n[0][100] = 6.1e-6 / 1.5 * 1.2 * 1.07;
//for 16nm DG HP
I_g_on_n[0][0] = 1.07e-9;//A/micron
I_g_on_n[0][10] = 1.07e-9;
I_g_on_n[0][20] = 1.07e-9;
I_g_on_n[0][30] = 1.07e-9;
I_g_on_n[0][40] = 1.07e-9;
I_g_on_n[0][50] = 1.07e-9;
I_g_on_n[0][60] = 1.07e-9;
I_g_on_n[0][70] = 1.07e-9;
I_g_on_n[0][80] = 1.07e-9;
I_g_on_n[0][90] = 1.07e-9;
I_g_on_n[0][100] = 1.07e-9;
if (ram_cell_tech_type == 3) {} else if (ram_cell_tech_type == 4) {
//22 nm commodity DRAM cell access transistor technology parameters.
//parameters
curr_vdd_dram_cell = 0.9;//0.45;//This value has reduced greatly in 2007 ITRS for all technology nodes. In
//2005 ITRS, the value was about twice the value in 2007 ITRS
Lphy[3] = 0.022;//micron
Lelec[3] = 0.0181;//micron.
curr_v_th_dram_access_transistor = 1;//V
width_dram_access_transistor = 0.022;//micron
curr_I_on_dram_cell = 20e-6; //This is a typical value that I have always
//kept constant. In reality this could perhaps be lower
curr_I_off_dram_cell_worst_case_length_temp = 1e-15;//A
curr_Wmemcella_dram = width_dram_access_transistor;
curr_Wmemcellpmos_dram = 0;
curr_Wmemcellnmos_dram = 0;
curr_area_cell_dram = 6 * 0.022 * 0.022;//micron2.
curr_asp_ratio_cell_dram = 0.667;
curr_c_dram_cell = 30e-15;//This is a typical value that I have alwaus
//kept constant.
//22 nm commodity DRAM wordline transistor parameters obtained using MASTAR.
curr_vpp = 2.3;//vpp. V
t_ox[3] = 3.5e-3;//micron
v_th[3] = 1.0;//V
c_ox[3] = 9.06e-15;//F/micron2
mobility_eff[3] = 367.29 * (1e-2 * 1e6 * 1e-2 * 1e6);//micron2 / Vs
Vdsat[3] = 0.0972; //V/micron
c_g_ideal[3] = 1.99e-16;//F/micron
c_fringe[3] = 0.053e-15;//F/micron
c_junc[3] = 1e-15;//F/micron2
I_on_n[3] = 910.5e-6;//A/micron
I_on_p[3] = I_on_n[3] / 2;//This value for I_on_p is not really used.
nmos_effective_resistance_multiplier = 1.69;//Using the value from 32nm.
//
n_to_p_eff_curr_drv_ratio[3] = 1.95;//Using the value from 32nm
gmp_to_gmn_multiplier[3] = 0.90;
Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];//ohm-micron
Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];//ohm-micron
long_channel_leakage_reduction[3] = 1;
I_off_n[3][0] = 1.1e-13; //A/micron
I_off_n[3][10] = 2.11e-13;
I_off_n[3][20] = 3.88e-13;
I_off_n[3][30] = 6.9e-13;
I_off_n[3][40] = 1.19e-12;
I_off_n[3][50] = 1.98e-12;
I_off_n[3][60] = 3.22e-12;
I_off_n[3][70] = 5.09e-12;
I_off_n[3][80] = 7.85e-12;
I_off_n[3][90] = 1.18e-11;
I_off_n[3][100] = 1.72e-11;
} else {
//some error handler
}
//SRAM cell properties
curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_sram = 1.46;
//CAM cell properties //TODO: data need to be revisited
curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
curr_asp_ratio_cell_cam = 2.92;
//Empirical undifferetiated core/FU coefficient
curr_logic_scaling_co_eff = 0.7 * 0.7 * 0.7 * 0.7 * 0.7;
curr_core_tx_density = 1.25 / 0.7 / 0.7 / 0.7;
curr_sckt_co_eff = 1.1296;
curr_chip_layout_overhead = 1.2;//die measurement results based on Niagara 1 and 2
curr_macro_layout_overhead = 1.1;//EDA placement and routing tool rule of thumb
}
g_tp.peri_global.Vdd += curr_alpha * vdd[peri_global_tech_type];
g_tp.peri_global.t_ox += curr_alpha * t_ox[peri_global_tech_type];
g_tp.peri_global.Vth += curr_alpha * v_th[peri_global_tech_type];
g_tp.peri_global.C_ox += curr_alpha * c_ox[peri_global_tech_type];
g_tp.peri_global.C_g_ideal += curr_alpha * c_g_ideal[peri_global_tech_type];
g_tp.peri_global.C_fringe += curr_alpha * c_fringe[peri_global_tech_type];
g_tp.peri_global.C_junc += curr_alpha * c_junc[peri_global_tech_type];
g_tp.peri_global.C_junc_sidewall = 0.25e-15; // F/micron
g_tp.peri_global.l_phy += curr_alpha * Lphy[peri_global_tech_type];
g_tp.peri_global.l_elec += curr_alpha * Lelec[peri_global_tech_type];
g_tp.peri_global.I_on_n += curr_alpha * I_on_n[peri_global_tech_type];
g_tp.peri_global.R_nch_on += curr_alpha * Rnchannelon[peri_global_tech_type];
g_tp.peri_global.R_pch_on += curr_alpha * Rpchannelon[peri_global_tech_type];
g_tp.peri_global.n_to_p_eff_curr_drv_ratio
+= curr_alpha * n_to_p_eff_curr_drv_ratio[peri_global_tech_type];
g_tp.peri_global.long_channel_leakage_reduction
+= curr_alpha * long_channel_leakage_reduction[peri_global_tech_type];
g_tp.peri_global.I_off_n += curr_alpha * I_off_n[peri_global_tech_type][g_ip->temp - 300];
g_tp.peri_global.I_off_p += curr_alpha * I_off_n[peri_global_tech_type][g_ip->temp - 300];
g_tp.peri_global.I_g_on_n += curr_alpha * I_g_on_n[peri_global_tech_type][g_ip->temp - 300];
g_tp.peri_global.I_g_on_p += curr_alpha * I_g_on_n[peri_global_tech_type][g_ip->temp - 300];
gmp_to_gmn_multiplier_periph_global += curr_alpha * gmp_to_gmn_multiplier[peri_global_tech_type];
g_tp.sram_cell.Vdd += curr_alpha * vdd[ram_cell_tech_type];
g_tp.sram_cell.l_phy += curr_alpha * Lphy[ram_cell_tech_type];
g_tp.sram_cell.l_elec += curr_alpha * Lelec[ram_cell_tech_type];
g_tp.sram_cell.t_ox += curr_alpha * t_ox[ram_cell_tech_type];
g_tp.sram_cell.Vth += curr_alpha * v_th[ram_cell_tech_type];
g_tp.sram_cell.C_g_ideal += curr_alpha * c_g_ideal[ram_cell_tech_type];
g_tp.sram_cell.C_fringe += curr_alpha * c_fringe[ram_cell_tech_type];
g_tp.sram_cell.C_junc += curr_alpha * c_junc[ram_cell_tech_type];
g_tp.sram_cell.C_junc_sidewall = 0.25e-15; // F/micron
g_tp.sram_cell.I_on_n += curr_alpha * I_on_n[ram_cell_tech_type];
g_tp.sram_cell.R_nch_on += curr_alpha * Rnchannelon[ram_cell_tech_type];
g_tp.sram_cell.R_pch_on += curr_alpha * Rpchannelon[ram_cell_tech_type];
g_tp.sram_cell.n_to_p_eff_curr_drv_ratio += curr_alpha * n_to_p_eff_curr_drv_ratio[ram_cell_tech_type];
g_tp.sram_cell.long_channel_leakage_reduction += curr_alpha * long_channel_leakage_reduction[ram_cell_tech_type];
g_tp.sram_cell.I_off_n += curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.sram_cell.I_off_p += curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.sram_cell.I_g_on_n += curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.sram_cell.I_g_on_p += curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.dram_cell_Vdd += curr_alpha * curr_vdd_dram_cell;
g_tp.dram_acc.Vth += curr_alpha * curr_v_th_dram_access_transistor;
g_tp.dram_acc.l_phy += curr_alpha * Lphy[dram_cell_tech_flavor];
g_tp.dram_acc.l_elec += curr_alpha * Lelec[dram_cell_tech_flavor];
g_tp.dram_acc.C_g_ideal += curr_alpha * c_g_ideal[dram_cell_tech_flavor];
g_tp.dram_acc.C_fringe += curr_alpha * c_fringe[dram_cell_tech_flavor];
g_tp.dram_acc.C_junc += curr_alpha * c_junc[dram_cell_tech_flavor];
g_tp.dram_acc.C_junc_sidewall = 0.25e-15; // F/micron
g_tp.dram_cell_I_on += curr_alpha * curr_I_on_dram_cell;
g_tp.dram_cell_I_off_worst_case_len_temp += curr_alpha * curr_I_off_dram_cell_worst_case_length_temp;
g_tp.dram_acc.I_on_n += curr_alpha * I_on_n[dram_cell_tech_flavor];
g_tp.dram_cell_C += curr_alpha * curr_c_dram_cell;
g_tp.vpp += curr_alpha * curr_vpp;
g_tp.dram_wl.l_phy += curr_alpha * Lphy[dram_cell_tech_flavor];
g_tp.dram_wl.l_elec += curr_alpha * Lelec[dram_cell_tech_flavor];
g_tp.dram_wl.C_g_ideal += curr_alpha * c_g_ideal[dram_cell_tech_flavor];
g_tp.dram_wl.C_fringe += curr_alpha * c_fringe[dram_cell_tech_flavor];
g_tp.dram_wl.C_junc += curr_alpha * c_junc[dram_cell_tech_flavor];
g_tp.dram_wl.C_junc_sidewall = 0.25e-15; // F/micron
g_tp.dram_wl.I_on_n += curr_alpha * I_on_n[dram_cell_tech_flavor];
g_tp.dram_wl.R_nch_on += curr_alpha * Rnchannelon[dram_cell_tech_flavor];
g_tp.dram_wl.R_pch_on += curr_alpha * Rpchannelon[dram_cell_tech_flavor];
g_tp.dram_wl.n_to_p_eff_curr_drv_ratio += curr_alpha * n_to_p_eff_curr_drv_ratio[dram_cell_tech_flavor];
g_tp.dram_wl.long_channel_leakage_reduction += curr_alpha * long_channel_leakage_reduction[dram_cell_tech_flavor];
g_tp.dram_wl.I_off_n += curr_alpha * I_off_n[dram_cell_tech_flavor][g_ip->temp - 300];
g_tp.dram_wl.I_off_p += curr_alpha * I_off_n[dram_cell_tech_flavor][g_ip->temp - 300];
g_tp.cam_cell.Vdd += curr_alpha * vdd[ram_cell_tech_type];
g_tp.cam_cell.l_phy += curr_alpha * Lphy[ram_cell_tech_type];
g_tp.cam_cell.l_elec += curr_alpha * Lelec[ram_cell_tech_type];
g_tp.cam_cell.t_ox += curr_alpha * t_ox[ram_cell_tech_type];
g_tp.cam_cell.Vth += curr_alpha * v_th[ram_cell_tech_type];
g_tp.cam_cell.C_g_ideal += curr_alpha * c_g_ideal[ram_cell_tech_type];
g_tp.cam_cell.C_fringe += curr_alpha * c_fringe[ram_cell_tech_type];
g_tp.cam_cell.C_junc += curr_alpha * c_junc[ram_cell_tech_type];
g_tp.cam_cell.C_junc_sidewall = 0.25e-15; // F/micron
g_tp.cam_cell.I_on_n += curr_alpha * I_on_n[ram_cell_tech_type];
g_tp.cam_cell.R_nch_on += curr_alpha * Rnchannelon[ram_cell_tech_type];
g_tp.cam_cell.R_pch_on += curr_alpha * Rpchannelon[ram_cell_tech_type];
g_tp.cam_cell.n_to_p_eff_curr_drv_ratio += curr_alpha * n_to_p_eff_curr_drv_ratio[ram_cell_tech_type];
g_tp.cam_cell.long_channel_leakage_reduction += curr_alpha * long_channel_leakage_reduction[ram_cell_tech_type];
g_tp.cam_cell.I_off_n += curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.cam_cell.I_off_p += curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.cam_cell.I_g_on_n += curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.cam_cell.I_g_on_p += curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
g_tp.dram.cell_a_w += curr_alpha * curr_Wmemcella_dram;
g_tp.dram.cell_pmos_w += curr_alpha * curr_Wmemcellpmos_dram;
g_tp.dram.cell_nmos_w += curr_alpha * curr_Wmemcellnmos_dram;
area_cell_dram += curr_alpha * curr_area_cell_dram;
asp_ratio_cell_dram += curr_alpha * curr_asp_ratio_cell_dram;
g_tp.sram.cell_a_w += curr_alpha * curr_Wmemcella_sram;
g_tp.sram.cell_pmos_w += curr_alpha * curr_Wmemcellpmos_sram;
g_tp.sram.cell_nmos_w += curr_alpha * curr_Wmemcellnmos_sram;
area_cell_sram += curr_alpha * curr_area_cell_sram;
asp_ratio_cell_sram += curr_alpha * curr_asp_ratio_cell_sram;
g_tp.cam.cell_a_w += curr_alpha * curr_Wmemcella_cam;//sheng
g_tp.cam.cell_pmos_w += curr_alpha * curr_Wmemcellpmos_cam;
g_tp.cam.cell_nmos_w += curr_alpha * curr_Wmemcellnmos_cam;
area_cell_cam += curr_alpha * curr_area_cell_cam;
asp_ratio_cell_cam += curr_alpha * curr_asp_ratio_cell_cam;
//Sense amplifier latch Gm calculation
mobility_eff_periph_global += curr_alpha * mobility_eff[peri_global_tech_type];
Vdsat_periph_global += curr_alpha * Vdsat[peri_global_tech_type];
//Empirical undifferetiated core/FU coefficient
g_tp.scaling_factor.logic_scaling_co_eff += curr_alpha * curr_logic_scaling_co_eff;
g_tp.scaling_factor.core_tx_density += curr_alpha * curr_core_tx_density;
g_tp.chip_layout_overhead += curr_alpha * curr_chip_layout_overhead;
g_tp.macro_layout_overhead += curr_alpha * curr_macro_layout_overhead;
g_tp.sckt_co_eff += curr_alpha * curr_sckt_co_eff;
}
//Currently we are not modeling the resistance/capacitance of poly anywhere.
//Continuous function (or date have been processed) does not need linear interpolation
g_tp.w_comp_inv_p1 = 12.5 * g_ip->F_sz_um;//this was 10 micron for the 0.8 micron process
g_tp.w_comp_inv_n1 = 7.5 * g_ip->F_sz_um;//this was 6 micron for the 0.8 micron process
g_tp.w_comp_inv_p2 = 25 * g_ip->F_sz_um;//this was 20 micron for the 0.8 micron process
g_tp.w_comp_inv_n2 = 15 * g_ip->F_sz_um;//this was 12 micron for the 0.8 micron process
g_tp.w_comp_inv_p3 = 50 * g_ip->F_sz_um;//this was 40 micron for the 0.8 micron process
g_tp.w_comp_inv_n3 = 30 * g_ip->F_sz_um;//this was 24 micron for the 0.8 micron process
g_tp.w_eval_inv_p = 100 * g_ip->F_sz_um;//this was 80 micron for the 0.8 micron process
g_tp.w_eval_inv_n = 50 * g_ip->F_sz_um;//this was 40 micron for the 0.8 micron process
g_tp.w_comp_n = 12.5 * g_ip->F_sz_um;//this was 10 micron for the 0.8 micron process
g_tp.w_comp_p = 37.5 * g_ip->F_sz_um;//this was 30 micron for the 0.8 micron process
g_tp.MIN_GAP_BET_P_AND_N_DIFFS = 5 * g_ip->F_sz_um;
g_tp.MIN_GAP_BET_SAME_TYPE_DIFFS = 1.5 * g_ip->F_sz_um;
g_tp.HPOWERRAIL = 2 * g_ip->F_sz_um;
g_tp.cell_h_def = 50 * g_ip->F_sz_um;
g_tp.w_poly_contact = g_ip->F_sz_um;
g_tp.spacing_poly_to_contact = g_ip->F_sz_um;
g_tp.spacing_poly_to_poly = 1.5 * g_ip->F_sz_um;
g_tp.ram_wl_stitching_overhead_ = 7.5 * g_ip->F_sz_um;
g_tp.min_w_nmos_ = 3 * g_ip->F_sz_um / 2;
g_tp.max_w_nmos_ = 100 * g_ip->F_sz_um;
//was 10 micron for the 0.8 micron process
g_tp.w_iso = 12.5 * g_ip->F_sz_um;
// sense amplifier N-trans; was 3 micron for the 0.8 micron process
g_tp.w_sense_n = 3.75 * g_ip->F_sz_um;
// sense amplifier P-trans; was 6 micron for the 0.8 micron process
g_tp.w_sense_p = 7.5 * g_ip->F_sz_um;
// Sense enable transistor of the sense amplifier; was 4 micron for the
//0.8 micron process
g_tp.w_sense_en = 5 * g_ip->F_sz_um;
g_tp.w_nmos_b_mux = 6 * g_tp.min_w_nmos_;
g_tp.w_nmos_sa_mux= 6 * g_tp.min_w_nmos_;
if (ram_cell_tech_type == comm_dram) {
g_tp.max_w_nmos_dec = 8 * g_ip->F_sz_um;
g_tp.h_dec = 8; // in the unit of memory cell height
} else {
g_tp.max_w_nmos_dec = g_tp.max_w_nmos_;
g_tp.h_dec = 4; // in the unit of memory cell height
}
g_tp.peri_global.C_overlap = 0.2 * g_tp.peri_global.C_g_ideal;
g_tp.sram_cell.C_overlap = 0.2 * g_tp.sram_cell.C_g_ideal;
g_tp.cam_cell.C_overlap = 0.2 * g_tp.cam_cell.C_g_ideal;
g_tp.dram_acc.C_overlap = 0.2 * g_tp.dram_acc.C_g_ideal;
g_tp.dram_acc.R_nch_on = g_tp.dram_cell_Vdd / g_tp.dram_acc.I_on_n;
//g_tp.dram_acc.R_pch_on = g_tp.dram_cell_Vdd / g_tp.dram_acc.I_on_p;
g_tp.dram_wl.C_overlap = 0.2 * g_tp.dram_wl.C_g_ideal;
double gmn_sense_amp_latch = (mobility_eff_periph_global / 2) * g_tp.peri_global.C_ox * (g_tp.w_sense_n / g_tp.peri_global.l_elec) * Vdsat_periph_global;
double gmp_sense_amp_latch = gmp_to_gmn_multiplier_periph_global * gmn_sense_amp_latch;
g_tp.gm_sense_amp_latch = gmn_sense_amp_latch + gmp_sense_amp_latch;
g_tp.dram.b_w = sqrt(area_cell_dram / (asp_ratio_cell_dram));
g_tp.dram.b_h = asp_ratio_cell_dram * g_tp.dram.b_w;
g_tp.sram.b_w = sqrt(area_cell_sram / (asp_ratio_cell_sram));
g_tp.sram.b_h = asp_ratio_cell_sram * g_tp.sram.b_w;
g_tp.cam.b_w = sqrt(area_cell_cam / (asp_ratio_cell_cam));//Sheng
g_tp.cam.b_h = asp_ratio_cell_cam * g_tp.cam.b_w;
g_tp.dram.Vbitpre = g_tp.dram_cell_Vdd;
g_tp.sram.Vbitpre = vdd[ram_cell_tech_type];
g_tp.cam.Vbitpre = vdd[ram_cell_tech_type];//Sheng
pmos_to_nmos_sizing_r = pmos_to_nmos_sz_ratio();
g_tp.w_pmos_bl_precharge = 6 * pmos_to_nmos_sizing_r * g_tp.min_w_nmos_;
g_tp.w_pmos_bl_eq = pmos_to_nmos_sizing_r * g_tp.min_w_nmos_;
double wire_pitch [NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
wire_r_per_micron[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
wire_c_per_micron[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
horiz_dielectric_constant[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
vert_dielectric_constant[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
aspect_ratio[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
miller_value[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
ild_thickness[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES];
for (iter = 0; iter <= 1; ++iter) {
// linear interpolation
if (iter == 0) {
tech = tech_lo;
if (tech_lo == tech_hi) {
curr_alpha = 1;
} else {
curr_alpha = (technology - tech_hi) / (tech_lo - tech_hi);
}
} else {
tech = tech_hi;
if (tech_lo == tech_hi) {
break;
} else {
curr_alpha = (tech_lo - technology) / (tech_lo - tech_hi);
}
}
if (tech == 180) {
//Aggressive projections
wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;//micron
aspect_ratio[0][0] = 2.0;
wire_width = wire_pitch[0][0] / 2; //micron
wire_thickness = aspect_ratio[0][0] * wire_width;//micron
wire_spacing = wire_pitch[0][0] - wire_width;//micron
barrier_thickness = 0.017;//micron
dishing_thickness = 0;//micron
alpha_scatter = 1;
wire_r_per_micron[0][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);//ohm/micron
ild_thickness[0][0] = 0.75;//micron
miller_value[0][0] = 1.5;
horiz_dielectric_constant[0][0] = 2.709;
vert_dielectric_constant[0][0] = 3.9;
fringe_cap = 0.115e-15; //F/micron
wire_c_per_micron[0][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][0], miller_value[0][0], horiz_dielectric_constant[0][0],
vert_dielectric_constant[0][0],
fringe_cap);//F/micron.
wire_pitch[0][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[0][1] / 2;
aspect_ratio[0][1] = 2.4;
wire_thickness = aspect_ratio[0][1] * wire_width;
wire_spacing = wire_pitch[0][1] - wire_width;
wire_r_per_micron[0][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][1] = 0.75;//micron
miller_value[0][1] = 1.5;
horiz_dielectric_constant[0][1] = 2.709;
vert_dielectric_constant[0][1] = 3.9;
fringe_cap = 0.115e-15; //F/micron
wire_c_per_micron[0][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][1], miller_value[0][1], horiz_dielectric_constant[0][1],
vert_dielectric_constant[0][1],
fringe_cap);
wire_pitch[0][2] = 8 * g_ip->F_sz_um;
aspect_ratio[0][2] = 2.2;
wire_width = wire_pitch[0][2] / 2;
wire_thickness = aspect_ratio[0][2] * wire_width;
wire_spacing = wire_pitch[0][2] - wire_width;
wire_r_per_micron[0][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][2] = 1.5;
miller_value[0][2] = 1.5;
horiz_dielectric_constant[0][2] = 2.709;
vert_dielectric_constant[0][2] = 3.9;
wire_c_per_micron[0][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][2], miller_value[0][2], horiz_dielectric_constant[0][2], vert_dielectric_constant[0][2],
fringe_cap);
//Conservative projections
wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[1][0] = 2.0;
wire_width = wire_pitch[1][0] / 2;
wire_thickness = aspect_ratio[1][0] * wire_width;
wire_spacing = wire_pitch[1][0] - wire_width;
barrier_thickness = 0.017;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[1][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][0] = 0.75;
miller_value[1][0] = 1.5;
horiz_dielectric_constant[1][0] = 3.038;
vert_dielectric_constant[1][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][0], miller_value[1][0], horiz_dielectric_constant[1][0],
vert_dielectric_constant[1][0],
fringe_cap);
wire_pitch[1][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[1][1] / 2;
aspect_ratio[1][1] = 2.0;
wire_thickness = aspect_ratio[1][1] * wire_width;
wire_spacing = wire_pitch[1][1] - wire_width;
wire_r_per_micron[1][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][1] = 0.75;
miller_value[1][1] = 1.5;
horiz_dielectric_constant[1][1] = 3.038;
vert_dielectric_constant[1][1] = 3.9;
wire_c_per_micron[1][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][1], miller_value[1][1], horiz_dielectric_constant[1][1],
vert_dielectric_constant[1][1],
fringe_cap);
wire_pitch[1][2] = 8 * g_ip->F_sz_um;
aspect_ratio[1][2] = 2.2;
wire_width = wire_pitch[1][2] / 2;
wire_thickness = aspect_ratio[1][2] * wire_width;
wire_spacing = wire_pitch[1][2] - wire_width;
dishing_thickness = 0.1 * wire_thickness;
wire_r_per_micron[1][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][2] = 1.98;
miller_value[1][2] = 1.5;
horiz_dielectric_constant[1][2] = 3.038;
vert_dielectric_constant[1][2] = 3.9;
wire_c_per_micron[1][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][2] , miller_value[1][2], horiz_dielectric_constant[1][2], vert_dielectric_constant[1][2],
fringe_cap);
//Nominal projections for commodity DRAM wordline/bitline
wire_pitch[1][3] = 2 * 0.18;
wire_c_per_micron[1][3] = 60e-15 / (256 * 2 * 0.18);
wire_r_per_micron[1][3] = 12 / 0.18;
} else if (tech == 90) {
//Aggressive projections
wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;//micron
aspect_ratio[0][0] = 2.4;
wire_width = wire_pitch[0][0] / 2; //micron
wire_thickness = aspect_ratio[0][0] * wire_width;//micron
wire_spacing = wire_pitch[0][0] - wire_width;//micron
barrier_thickness = 0.01;//micron
dishing_thickness = 0;//micron
alpha_scatter = 1;
wire_r_per_micron[0][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);//ohm/micron
ild_thickness[0][0] = 0.48;//micron
miller_value[0][0] = 1.5;
horiz_dielectric_constant[0][0] = 2.709;
vert_dielectric_constant[0][0] = 3.9;
fringe_cap = 0.115e-15; //F/micron
wire_c_per_micron[0][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][0], miller_value[0][0], horiz_dielectric_constant[0][0],
vert_dielectric_constant[0][0],
fringe_cap);//F/micron.
wire_pitch[0][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[0][1] / 2;
aspect_ratio[0][1] = 2.4;
wire_thickness = aspect_ratio[0][1] * wire_width;
wire_spacing = wire_pitch[0][1] - wire_width;
wire_r_per_micron[0][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][1] = 0.48;//micron
miller_value[0][1] = 1.5;
horiz_dielectric_constant[0][1] = 2.709;
vert_dielectric_constant[0][1] = 3.9;
wire_c_per_micron[0][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][1], miller_value[0][1], horiz_dielectric_constant[0][1],
vert_dielectric_constant[0][1],
fringe_cap);
wire_pitch[0][2] = 8 * g_ip->F_sz_um;
aspect_ratio[0][2] = 2.7;
wire_width = wire_pitch[0][2] / 2;
wire_thickness = aspect_ratio[0][2] * wire_width;
wire_spacing = wire_pitch[0][2] - wire_width;
wire_r_per_micron[0][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][2] = 0.96;
miller_value[0][2] = 1.5;
horiz_dielectric_constant[0][2] = 2.709;
vert_dielectric_constant[0][2] = 3.9;
wire_c_per_micron[0][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][2], miller_value[0][2], horiz_dielectric_constant[0][2], vert_dielectric_constant[0][2],
fringe_cap);
//Conservative projections
wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[1][0] = 2.0;
wire_width = wire_pitch[1][0] / 2;
wire_thickness = aspect_ratio[1][0] * wire_width;
wire_spacing = wire_pitch[1][0] - wire_width;
barrier_thickness = 0.008;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[1][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][0] = 0.48;
miller_value[1][0] = 1.5;
horiz_dielectric_constant[1][0] = 3.038;
vert_dielectric_constant[1][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][0], miller_value[1][0], horiz_dielectric_constant[1][0],
vert_dielectric_constant[1][0],
fringe_cap);
wire_pitch[1][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[1][1] / 2;
aspect_ratio[1][1] = 2.0;
wire_thickness = aspect_ratio[1][1] * wire_width;
wire_spacing = wire_pitch[1][1] - wire_width;
wire_r_per_micron[1][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][1] = 0.48;
miller_value[1][1] = 1.5;
horiz_dielectric_constant[1][1] = 3.038;
vert_dielectric_constant[1][1] = 3.9;
wire_c_per_micron[1][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][1], miller_value[1][1], horiz_dielectric_constant[1][1],
vert_dielectric_constant[1][1],
fringe_cap);
wire_pitch[1][2] = 8 * g_ip->F_sz_um;
aspect_ratio[1][2] = 2.2;
wire_width = wire_pitch[1][2] / 2;
wire_thickness = aspect_ratio[1][2] * wire_width;
wire_spacing = wire_pitch[1][2] - wire_width;
dishing_thickness = 0.1 * wire_thickness;
wire_r_per_micron[1][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][2] = 1.1;
miller_value[1][2] = 1.5;
horiz_dielectric_constant[1][2] = 3.038;
vert_dielectric_constant[1][2] = 3.9;
wire_c_per_micron[1][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][2] , miller_value[1][2], horiz_dielectric_constant[1][2], vert_dielectric_constant[1][2],
fringe_cap);
//Nominal projections for commodity DRAM wordline/bitline
wire_pitch[1][3] = 2 * 0.09;
wire_c_per_micron[1][3] = 60e-15 / (256 * 2 * 0.09);
wire_r_per_micron[1][3] = 12 / 0.09;
} else if (tech == 65) {
//Aggressive projections
wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[0][0] = 2.7;
wire_width = wire_pitch[0][0] / 2;
wire_thickness = aspect_ratio[0][0] * wire_width;
wire_spacing = wire_pitch[0][0] - wire_width;
barrier_thickness = 0;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[0][0] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][0] = 0.405;
miller_value[0][0] = 1.5;
horiz_dielectric_constant[0][0] = 2.303;
vert_dielectric_constant[0][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[0][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][0] , miller_value[0][0] , horiz_dielectric_constant[0][0] , vert_dielectric_constant[0][0] ,
fringe_cap);
wire_pitch[0][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[0][1] / 2;
aspect_ratio[0][1] = 2.7;
wire_thickness = aspect_ratio[0][1] * wire_width;
wire_spacing = wire_pitch[0][1] - wire_width;
wire_r_per_micron[0][1] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][1] = 0.405;
miller_value[0][1] = 1.5;
horiz_dielectric_constant[0][1] = 2.303;
vert_dielectric_constant[0][1] = 3.9;
wire_c_per_micron[0][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][1], miller_value[0][1], horiz_dielectric_constant[0][1],
vert_dielectric_constant[0][1],
fringe_cap);
wire_pitch[0][2] = 8 * g_ip->F_sz_um;
aspect_ratio[0][2] = 2.8;
wire_width = wire_pitch[0][2] / 2;
wire_thickness = aspect_ratio[0][2] * wire_width;
wire_spacing = wire_pitch[0][2] - wire_width;
wire_r_per_micron[0][2] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][2] = 0.81;
miller_value[0][2] = 1.5;
horiz_dielectric_constant[0][2] = 2.303;
vert_dielectric_constant[0][2] = 3.9;
wire_c_per_micron[0][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][2], miller_value[0][2], horiz_dielectric_constant[0][2], vert_dielectric_constant[0][2],
fringe_cap);
//Conservative projections
wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[1][0] = 2.0;
wire_width = wire_pitch[1][0] / 2;
wire_thickness = aspect_ratio[1][0] * wire_width;
wire_spacing = wire_pitch[1][0] - wire_width;
barrier_thickness = 0.006;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[1][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][0] = 0.405;
miller_value[1][0] = 1.5;
horiz_dielectric_constant[1][0] = 2.734;
vert_dielectric_constant[1][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][0], miller_value[1][0], horiz_dielectric_constant[1][0], vert_dielectric_constant[1][0],
fringe_cap);
wire_pitch[1][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[1][1] / 2;
aspect_ratio[1][1] = 2.0;
wire_thickness = aspect_ratio[1][1] * wire_width;
wire_spacing = wire_pitch[1][1] - wire_width;
wire_r_per_micron[1][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][1] = 0.405;
miller_value[1][1] = 1.5;
horiz_dielectric_constant[1][1] = 2.734;
vert_dielectric_constant[1][1] = 3.9;
wire_c_per_micron[1][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][1], miller_value[1][1], horiz_dielectric_constant[1][1], vert_dielectric_constant[1][1],
fringe_cap);
wire_pitch[1][2] = 8 * g_ip->F_sz_um;
aspect_ratio[1][2] = 2.2;
wire_width = wire_pitch[1][2] / 2;
wire_thickness = aspect_ratio[1][2] * wire_width;
wire_spacing = wire_pitch[1][2] - wire_width;
dishing_thickness = 0.1 * wire_thickness;
wire_r_per_micron[1][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][2] = 0.77;
miller_value[1][2] = 1.5;
horiz_dielectric_constant[1][2] = 2.734;
vert_dielectric_constant[1][2] = 3.9;
wire_c_per_micron[1][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][2], miller_value[1][2], horiz_dielectric_constant[1][2], vert_dielectric_constant[1][2],
fringe_cap);
//Nominal projections for commodity DRAM wordline/bitline
wire_pitch[1][3] = 2 * 0.065;
wire_c_per_micron[1][3] = 52.5e-15 / (256 * 2 * 0.065);
wire_r_per_micron[1][3] = 12 / 0.065;
} else if (tech == 45) {
//Aggressive projections.
wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[0][0] = 3.0;
wire_width = wire_pitch[0][0] / 2;
wire_thickness = aspect_ratio[0][0] * wire_width;
wire_spacing = wire_pitch[0][0] - wire_width;
barrier_thickness = 0;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[0][0] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][0] = 0.315;
miller_value[0][0] = 1.5;
horiz_dielectric_constant[0][0] = 1.958;
vert_dielectric_constant[0][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[0][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][0] , miller_value[0][0] , horiz_dielectric_constant[0][0] , vert_dielectric_constant[0][0] ,
fringe_cap);
wire_pitch[0][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[0][1] / 2;
aspect_ratio[0][1] = 3.0;
wire_thickness = aspect_ratio[0][1] * wire_width;
wire_spacing = wire_pitch[0][1] - wire_width;
wire_r_per_micron[0][1] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][1] = 0.315;
miller_value[0][1] = 1.5;
horiz_dielectric_constant[0][1] = 1.958;
vert_dielectric_constant[0][1] = 3.9;
wire_c_per_micron[0][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][1], miller_value[0][1], horiz_dielectric_constant[0][1], vert_dielectric_constant[0][1],
fringe_cap);
wire_pitch[0][2] = 8 * g_ip->F_sz_um;
aspect_ratio[0][2] = 3.0;
wire_width = wire_pitch[0][2] / 2;
wire_thickness = aspect_ratio[0][2] * wire_width;
wire_spacing = wire_pitch[0][2] - wire_width;
wire_r_per_micron[0][2] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][2] = 0.63;
miller_value[0][2] = 1.5;
horiz_dielectric_constant[0][2] = 1.958;
vert_dielectric_constant[0][2] = 3.9;
wire_c_per_micron[0][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][2], miller_value[0][2], horiz_dielectric_constant[0][2], vert_dielectric_constant[0][2],
fringe_cap);
//Conservative projections
wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[1][0] = 2.0;
wire_width = wire_pitch[1][0] / 2;
wire_thickness = aspect_ratio[1][0] * wire_width;
wire_spacing = wire_pitch[1][0] - wire_width;
barrier_thickness = 0.004;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[1][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][0] = 0.315;
miller_value[1][0] = 1.5;
horiz_dielectric_constant[1][0] = 2.46;
vert_dielectric_constant[1][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][0], miller_value[1][0], horiz_dielectric_constant[1][0], vert_dielectric_constant[1][0],
fringe_cap);
wire_pitch[1][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[1][1] / 2;
aspect_ratio[1][1] = 2.0;
wire_thickness = aspect_ratio[1][1] * wire_width;
wire_spacing = wire_pitch[1][1] - wire_width;
wire_r_per_micron[1][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][1] = 0.315;
miller_value[1][1] = 1.5;
horiz_dielectric_constant[1][1] = 2.46;
vert_dielectric_constant[1][1] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][1], miller_value[1][1], horiz_dielectric_constant[1][1], vert_dielectric_constant[1][1],
fringe_cap);
wire_pitch[1][2] = 8 * g_ip->F_sz_um;
aspect_ratio[1][2] = 2.2;
wire_width = wire_pitch[1][2] / 2;
wire_thickness = aspect_ratio[1][2] * wire_width;
wire_spacing = wire_pitch[1][2] - wire_width;
dishing_thickness = 0.1 * wire_thickness;
wire_r_per_micron[1][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][2] = 0.55;
miller_value[1][2] = 1.5;
horiz_dielectric_constant[1][2] = 2.46;
vert_dielectric_constant[1][2] = 3.9;
wire_c_per_micron[1][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][2], miller_value[1][2], horiz_dielectric_constant[1][2], vert_dielectric_constant[1][2],
fringe_cap);
//Nominal projections for commodity DRAM wordline/bitline
wire_pitch[1][3] = 2 * 0.045;
wire_c_per_micron[1][3] = 37.5e-15 / (256 * 2 * 0.045);
wire_r_per_micron[1][3] = 12 / 0.045;
} else if (tech == 32) {
//Aggressive projections.
wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[0][0] = 3.0;
wire_width = wire_pitch[0][0] / 2;
wire_thickness = aspect_ratio[0][0] * wire_width;
wire_spacing = wire_pitch[0][0] - wire_width;
barrier_thickness = 0;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[0][0] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][0] = 0.21;
miller_value[0][0] = 1.5;
horiz_dielectric_constant[0][0] = 1.664;
vert_dielectric_constant[0][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[0][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][0], miller_value[0][0], horiz_dielectric_constant[0][0], vert_dielectric_constant[0][0],
fringe_cap);
wire_pitch[0][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[0][1] / 2;
aspect_ratio[0][1] = 3.0;
wire_thickness = aspect_ratio[0][1] * wire_width;
wire_spacing = wire_pitch[0][1] - wire_width;
wire_r_per_micron[0][1] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][1] = 0.21;
miller_value[0][1] = 1.5;
horiz_dielectric_constant[0][1] = 1.664;
vert_dielectric_constant[0][1] = 3.9;
wire_c_per_micron[0][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][1], miller_value[0][1], horiz_dielectric_constant[0][1], vert_dielectric_constant[0][1],
fringe_cap);
wire_pitch[0][2] = 8 * g_ip->F_sz_um;
aspect_ratio[0][2] = 3.0;
wire_width = wire_pitch[0][2] / 2;
wire_thickness = aspect_ratio[0][2] * wire_width;
wire_spacing = wire_pitch[0][2] - wire_width;
wire_r_per_micron[0][2] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][2] = 0.42;
miller_value[0][2] = 1.5;
horiz_dielectric_constant[0][2] = 1.664;
vert_dielectric_constant[0][2] = 3.9;
wire_c_per_micron[0][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][2], miller_value[0][2], horiz_dielectric_constant[0][2], vert_dielectric_constant[0][2],
fringe_cap);
//Conservative projections
wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[1][0] = 2.0;
wire_width = wire_pitch[1][0] / 2;
wire_thickness = aspect_ratio[1][0] * wire_width;
wire_spacing = wire_pitch[1][0] - wire_width;
barrier_thickness = 0.003;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[1][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][0] = 0.21;
miller_value[1][0] = 1.5;
horiz_dielectric_constant[1][0] = 2.214;
vert_dielectric_constant[1][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][0], miller_value[1][0], horiz_dielectric_constant[1][0], vert_dielectric_constant[1][0],
fringe_cap);
wire_pitch[1][1] = 4 * g_ip->F_sz_um;
aspect_ratio[1][1] = 2.0;
wire_width = wire_pitch[1][1] / 2;
wire_thickness = aspect_ratio[1][1] * wire_width;
wire_spacing = wire_pitch[1][1] - wire_width;
wire_r_per_micron[1][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][1] = 0.21;
miller_value[1][1] = 1.5;
horiz_dielectric_constant[1][1] = 2.214;
vert_dielectric_constant[1][1] = 3.9;
wire_c_per_micron[1][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][1], miller_value[1][1], horiz_dielectric_constant[1][1], vert_dielectric_constant[1][1],
fringe_cap);
wire_pitch[1][2] = 8 * g_ip->F_sz_um;
aspect_ratio[1][2] = 2.2;
wire_width = wire_pitch[1][2] / 2;
wire_thickness = aspect_ratio[1][2] * wire_width;
wire_spacing = wire_pitch[1][2] - wire_width;
dishing_thickness = 0.1 * wire_thickness;
wire_r_per_micron[1][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][2] = 0.385;
miller_value[1][2] = 1.5;
horiz_dielectric_constant[1][2] = 2.214;
vert_dielectric_constant[1][2] = 3.9;
wire_c_per_micron[1][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][2], miller_value[1][2], horiz_dielectric_constant[1][2], vert_dielectric_constant[1][2],
fringe_cap);
//Nominal projections for commodity DRAM wordline/bitline
wire_pitch[1][3] = 2 * 0.032;//micron
wire_c_per_micron[1][3] = 31e-15 / (256 * 2 * 0.032);//F/micron
wire_r_per_micron[1][3] = 12 / 0.032;//ohm/micron
} else if (tech == 22) {
//Aggressive projections.
wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;//local
aspect_ratio[0][0] = 3.0;
wire_width = wire_pitch[0][0] / 2;
wire_thickness = aspect_ratio[0][0] * wire_width;
wire_spacing = wire_pitch[0][0] - wire_width;
barrier_thickness = 0;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[0][0] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][0] = 0.15;
miller_value[0][0] = 1.5;
horiz_dielectric_constant[0][0] = 1.414;
vert_dielectric_constant[0][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[0][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][0], miller_value[0][0], horiz_dielectric_constant[0][0], vert_dielectric_constant[0][0],
fringe_cap);
wire_pitch[0][1] = 4 * g_ip->F_sz_um;//semi-global
wire_width = wire_pitch[0][1] / 2;
aspect_ratio[0][1] = 3.0;
wire_thickness = aspect_ratio[0][1] * wire_width;
wire_spacing = wire_pitch[0][1] - wire_width;
wire_r_per_micron[0][1] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][1] = 0.15;
miller_value[0][1] = 1.5;
horiz_dielectric_constant[0][1] = 1.414;
vert_dielectric_constant[0][1] = 3.9;
wire_c_per_micron[0][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][1], miller_value[0][1], horiz_dielectric_constant[0][1], vert_dielectric_constant[0][1],
fringe_cap);
wire_pitch[0][2] = 8 * g_ip->F_sz_um;//global
aspect_ratio[0][2] = 3.0;
wire_width = wire_pitch[0][2] / 2;
wire_thickness = aspect_ratio[0][2] * wire_width;
wire_spacing = wire_pitch[0][2] - wire_width;
wire_r_per_micron[0][2] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][2] = 0.3;
miller_value[0][2] = 1.5;
horiz_dielectric_constant[0][2] = 1.414;
vert_dielectric_constant[0][2] = 3.9;
wire_c_per_micron[0][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][2], miller_value[0][2], horiz_dielectric_constant[0][2], vert_dielectric_constant[0][2],
fringe_cap);
//Conservative projections
wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[1][0] = 2.0;
wire_width = wire_pitch[1][0] / 2;
wire_thickness = aspect_ratio[1][0] * wire_width;
wire_spacing = wire_pitch[1][0] - wire_width;
barrier_thickness = 0.003;
dishing_thickness = 0;
alpha_scatter = 1.05;
wire_r_per_micron[1][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][0] = 0.15;
miller_value[1][0] = 1.5;
horiz_dielectric_constant[1][0] = 2.104;
vert_dielectric_constant[1][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][0], miller_value[1][0], horiz_dielectric_constant[1][0], vert_dielectric_constant[1][0],
fringe_cap);
wire_pitch[1][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[1][1] / 2;
aspect_ratio[1][1] = 2.0;
wire_thickness = aspect_ratio[1][1] * wire_width;
wire_spacing = wire_pitch[1][1] - wire_width;
wire_r_per_micron[1][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][1] = 0.15;
miller_value[1][1] = 1.5;
horiz_dielectric_constant[1][1] = 2.104;
vert_dielectric_constant[1][1] = 3.9;
wire_c_per_micron[1][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][1], miller_value[1][1], horiz_dielectric_constant[1][1], vert_dielectric_constant[1][1],
fringe_cap);
wire_pitch[1][2] = 8 * g_ip->F_sz_um;
aspect_ratio[1][2] = 2.2;
wire_width = wire_pitch[1][2] / 2;
wire_thickness = aspect_ratio[1][2] * wire_width;
wire_spacing = wire_pitch[1][2] - wire_width;
dishing_thickness = 0.1 * wire_thickness;
wire_r_per_micron[1][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][2] = 0.275;
miller_value[1][2] = 1.5;
horiz_dielectric_constant[1][2] = 2.104;
vert_dielectric_constant[1][2] = 3.9;
wire_c_per_micron[1][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][2], miller_value[1][2], horiz_dielectric_constant[1][2], vert_dielectric_constant[1][2],
fringe_cap);
//Nominal projections for commodity DRAM wordline/bitline
wire_pitch[1][3] = 2 * 0.022;//micron
wire_c_per_micron[1][3] = 31e-15 / (256 * 2 * 0.022);//F/micron
wire_r_per_micron[1][3] = 12 / 0.022;//ohm/micron
}
else if (tech == 16) {
//Aggressive projections.
wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;//local
aspect_ratio[0][0] = 3.0;
wire_width = wire_pitch[0][0] / 2;
wire_thickness = aspect_ratio[0][0] * wire_width;
wire_spacing = wire_pitch[0][0] - wire_width;
barrier_thickness = 0;
dishing_thickness = 0;
alpha_scatter = 1;
wire_r_per_micron[0][0] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][0] = 0.108;
miller_value[0][0] = 1.5;
horiz_dielectric_constant[0][0] = 1.202;
vert_dielectric_constant[0][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[0][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][0], miller_value[0][0], horiz_dielectric_constant[0][0], vert_dielectric_constant[0][0],
fringe_cap);
wire_pitch[0][1] = 4 * g_ip->F_sz_um;//semi-global
aspect_ratio[0][1] = 3.0;
wire_width = wire_pitch[0][1] / 2;
wire_thickness = aspect_ratio[0][1] * wire_width;
wire_spacing = wire_pitch[0][1] - wire_width;
wire_r_per_micron[0][1] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][1] = 0.108;
miller_value[0][1] = 1.5;
horiz_dielectric_constant[0][1] = 1.202;
vert_dielectric_constant[0][1] = 3.9;
wire_c_per_micron[0][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][1], miller_value[0][1], horiz_dielectric_constant[0][1], vert_dielectric_constant[0][1],
fringe_cap);
wire_pitch[0][2] = 8 * g_ip->F_sz_um;//global
aspect_ratio[0][2] = 3.0;
wire_width = wire_pitch[0][2] / 2;
wire_thickness = aspect_ratio[0][2] * wire_width;
wire_spacing = wire_pitch[0][2] - wire_width;
wire_r_per_micron[0][2] = wire_resistance(BULK_CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[0][2] = 0.216;
miller_value[0][2] = 1.5;
horiz_dielectric_constant[0][2] = 1.202;
vert_dielectric_constant[0][2] = 3.9;
wire_c_per_micron[0][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[0][2], miller_value[0][2], horiz_dielectric_constant[0][2], vert_dielectric_constant[0][2],
fringe_cap);
//Conservative projections
wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
aspect_ratio[1][0] = 2.0;
wire_width = wire_pitch[1][0] / 2;
wire_thickness = aspect_ratio[1][0] * wire_width;
wire_spacing = wire_pitch[1][0] - wire_width;
barrier_thickness = 0.002;
dishing_thickness = 0;
alpha_scatter = 1.05;
wire_r_per_micron[1][0] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][0] = 0.108;
miller_value[1][0] = 1.5;
horiz_dielectric_constant[1][0] = 1.998;
vert_dielectric_constant[1][0] = 3.9;
fringe_cap = 0.115e-15;
wire_c_per_micron[1][0] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][0], miller_value[1][0], horiz_dielectric_constant[1][0], vert_dielectric_constant[1][0],
fringe_cap);
wire_pitch[1][1] = 4 * g_ip->F_sz_um;
wire_width = wire_pitch[1][1] / 2;
aspect_ratio[1][1] = 2.0;
wire_thickness = aspect_ratio[1][1] * wire_width;
wire_spacing = wire_pitch[1][1] - wire_width;
wire_r_per_micron[1][1] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][1] = 0.108;
miller_value[1][1] = 1.5;
horiz_dielectric_constant[1][1] = 1.998;
vert_dielectric_constant[1][1] = 3.9;
wire_c_per_micron[1][1] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][1], miller_value[1][1], horiz_dielectric_constant[1][1], vert_dielectric_constant[1][1],
fringe_cap);
wire_pitch[1][2] = 8 * g_ip->F_sz_um;
aspect_ratio[1][2] = 2.2;
wire_width = wire_pitch[1][2] / 2;
wire_thickness = aspect_ratio[1][2] * wire_width;
wire_spacing = wire_pitch[1][2] - wire_width;
dishing_thickness = 0.1 * wire_thickness;
wire_r_per_micron[1][2] = wire_resistance(CU_RESISTIVITY, wire_width,
wire_thickness, barrier_thickness, dishing_thickness, alpha_scatter);
ild_thickness[1][2] = 0.198;
miller_value[1][2] = 1.5;
horiz_dielectric_constant[1][2] = 1.998;
vert_dielectric_constant[1][2] = 3.9;
wire_c_per_micron[1][2] = wire_capacitance(wire_width, wire_thickness, wire_spacing,
ild_thickness[1][2], miller_value[1][2], horiz_dielectric_constant[1][2], vert_dielectric_constant[1][2],
fringe_cap);
//Nominal projections for commodity DRAM wordline/bitline
wire_pitch[1][3] = 2 * 0.016;//micron
wire_c_per_micron[1][3] = 31e-15 / (256 * 2 * 0.016);//F/micron
wire_r_per_micron[1][3] = 12 / 0.016;//ohm/micron
}
g_tp.wire_local.pitch += curr_alpha *
wire_pitch[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_local.R_per_um += curr_alpha *
wire_r_per_micron[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_local.C_per_um += curr_alpha *
wire_c_per_micron[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_local.aspect_ratio += curr_alpha *
aspect_ratio[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_local.ild_thickness += curr_alpha *
ild_thickness[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_local.miller_value += curr_alpha *
miller_value[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_local.horiz_dielectric_constant += curr_alpha *
horiz_dielectric_constant[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_local.vert_dielectric_constant += curr_alpha *
vert_dielectric_constant[g_ip->ic_proj_type]
[(ram_cell_tech_type == comm_dram) ? 3 : 0];
g_tp.wire_inside_mat.pitch += curr_alpha *
wire_pitch[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
g_tp.wire_inside_mat.R_per_um += curr_alpha *
wire_r_per_micron[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
g_tp.wire_inside_mat.C_per_um += curr_alpha *
wire_c_per_micron[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
g_tp.wire_inside_mat.aspect_ratio += curr_alpha *
aspect_ratio[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
g_tp.wire_inside_mat.ild_thickness += curr_alpha *
ild_thickness[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
g_tp.wire_inside_mat.miller_value += curr_alpha *
miller_value[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
g_tp.wire_inside_mat.horiz_dielectric_constant += curr_alpha *
horiz_dielectric_constant[g_ip->ic_proj_type]
[g_ip->wire_is_mat_type];
g_tp.wire_inside_mat.vert_dielectric_constant += curr_alpha *
vert_dielectric_constant [g_ip->ic_proj_type]
[g_ip->wire_is_mat_type];
g_tp.wire_outside_mat.pitch += curr_alpha *
wire_pitch[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
g_tp.wire_outside_mat.R_per_um += curr_alpha *
wire_r_per_micron[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
g_tp.wire_outside_mat.C_per_um += curr_alpha *
wire_c_per_micron[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
g_tp.wire_outside_mat.aspect_ratio += curr_alpha *
aspect_ratio[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
g_tp.wire_outside_mat.ild_thickness += curr_alpha *
ild_thickness[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
g_tp.wire_outside_mat.miller_value += curr_alpha *
miller_value[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
g_tp.wire_outside_mat.horiz_dielectric_constant += curr_alpha *
horiz_dielectric_constant[g_ip->ic_proj_type]
[g_ip->wire_os_mat_type];
g_tp.wire_outside_mat.vert_dielectric_constant += curr_alpha *
vert_dielectric_constant [g_ip->ic_proj_type]
[g_ip->wire_os_mat_type];
g_tp.unit_len_wire_del = g_tp.wire_inside_mat.R_per_um *
g_tp.wire_inside_mat.C_per_um / 2;
g_tp.sense_delay += curr_alpha * SENSE_AMP_D;
g_tp.sense_dy_power += curr_alpha * SENSE_AMP_P;
}
g_tp.fringe_cap = fringe_cap;
double rd = tr_R_on(g_tp.min_w_nmos_, NCH, 1);
double p_to_n_sizing_r = pmos_to_nmos_sz_ratio();
double c_load = gate_C(g_tp.min_w_nmos_ * (1 + p_to_n_sizing_r), 0.0);
double tf = rd * c_load;
g_tp.kinv = horowitz(0, tf, 0.5, 0.5, RISE);
double KLOAD = 1;
c_load = KLOAD * (drain_C_(g_tp.min_w_nmos_, NCH, 1, 1, g_tp.cell_h_def) +
drain_C_(g_tp.min_w_nmos_ * p_to_n_sizing_r, PCH, 1, 1, g_tp.cell_h_def) +
gate_C(g_tp.min_w_nmos_ * 4 * (1 + p_to_n_sizing_r), 0.0));
tf = rd * c_load;
g_tp.FO4 = horowitz(0, tf, 0.5, 0.5, RISE);
}